2006
DOI: 10.1016/j.jcrysgro.2005.11.127
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Growth and characterization of CuAlSe2(112)/GaAs(100) heteroepitaxial layers grown by hot wall epitaxy method

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Cited by 6 publications
(2 citation statements)
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“…CuAlSe 2 has been deposited in thin film form by techniques like metalorganic chemical vapour deposition, metalorganic vapour phase epitaxy, molecular beam epitaxy, hot wall epitaxy, vacuum evaporation, etc. [2][3][4][5][6]. In this work, the pulse electrodeposition technique has been successfully employed for the deposition of thin CuAlSe 2 films.…”
Section: Introductionmentioning
confidence: 99%
“…CuAlSe 2 has been deposited in thin film form by techniques like metalorganic chemical vapour deposition, metalorganic vapour phase epitaxy, molecular beam epitaxy, hot wall epitaxy, vacuum evaporation, etc. [2][3][4][5][6]. In this work, the pulse electrodeposition technique has been successfully employed for the deposition of thin CuAlSe 2 films.…”
Section: Introductionmentioning
confidence: 99%
“…The CuAlSe 2 (1 1 2)/GaAs (1 0 0) heteroepitaxial layers were grown by the hot wall epitaxy (HWE) method. From the measurements of the Laue patterns and the double crystal X-ray diffraction, the CuAlSe 2 epilayer was confirmed to be the epitaxially grown layer along the 1 1 2 direction onto a GaAs (1 0 0) substrate [3]. Investigations on the CuIn 1−x Al x Se 2 (CIAS) system as a potential alternate to CIGS are quite important due to replacement of Ga by inexpensive and abundant Al.…”
Section: Introductionmentioning
confidence: 99%