The technological achievements in diamond thin film synthesis over the past decade subsequently led to the utilization of outstanding diamond properties and development of a wide range of applications in various fields of engineering. However, since most chemical vapour deposition (CVD) diamond films are polycrystalline, their characteristics strongly depend on their microstructure. As the number of possible applications for polycrystalline CVD diamond increases, there is constant development and enhancement of the film properties. Polycrystalline diamond in the form of thin films delivers further advantages over thicker polycrystalline layer, e.g., smoother surface, less deposition time and less light absorption. Furthermore, besides the relevant diamond properties, the suitability for applications also depends on various material parameters such as substrate nature, substrate dimensions, possibility of non-planar geometries, surface morphology, electrical conductivity, capability of device fabrication, electrochemical properties and cost.