GROWTH AND CHARACTERIZATION OF SiO₂ FILMS DEPOSITED BY FLAME HYDROLYSIS DEPOSITION SYSTEM FOR PHOTONIC DEVICE APPLICATION

Abstract

Abstract-There are various techniques for the deposition of SiO 2 films on silicon. Flame Hydrolysis Deposition (FHD) techniques is the most economical technique for the deposition of SiO 2 films. In this technique the SiO 2 films are deposited by hydrolysis of SiCl 4 in a high temperature H 2 -O 2 flame. In the present study we present the growth of SiO 2 films by indigenously developed FHD system and organic compound Tetraethoxyorthosiliate/Tetraethoxysilane TEOS as source of silicon. The films deposited by the FHD system are porous and need annealing at higher temperatures for the densification. We present here for the first time direct dense glassy transparent SiO 2 films deposited by our FHD system. The optical properties of the deposited films were studied by ellipsometery. FTIR spectroscopy was carried out to study the various characteristic peaks of SiO 2 bonds. The peaks corresponding to Si-O-Si stretching, bending and rocking modes are observed at 1090 cm −1 , 812 cm −1 and 463 cm −1 respectively. The absence of peaks corresponding to the OH bond in the deposited film reveals that the deposited films are most suitable for the photonic devices application. The surface analysis was carried out using SEM. The EDAX of the deposited film confirms the composition of the Si and O in the deposited film.

SiO2/polyvinylimidazole hybrid polymer as a sorbent for extraction by matrix solid-phase dispersion (MSPD): synthesis, characterization, and evaluation

“…Peaks at 1,086, 778, and 464 cm −1 were attributed to Si-OSi stretching, bending, and rocking modes, respectively, according to observations by Bange et al [24]. According to the technique used here, these results indicate that PVI is present on the surface of the SiO 2 particles.…”

Transparent hydrophobic and superhydrophobic coatings fabricated using polyamide 12–SiO2 nanocomposite

“…The spectrum exhibits characteristic absorption bands associated with both polyamide and silica. The observed peaks at 843 and 1043 cm −1 are attributed to Si―O bending vibration and asymmetric stretching vibration of Si―O―Si bands, respectively, that corresponds to SiO 2 in the coating . Further, the bands associated with CH 2 rocking type bending vibration, N―H bending, CO stretching, symmetric vibrations of C―H, asymmetric vibrations of C―H, C―H stretching and N―H stretching are found at 716, 1549, 1641, 2851, 2920, 3089 and 3291 cm −1 indicating the presence of polyamide in the nanocomposite coating …”

Novel silane encapsulation system for tribochemical resin bonding to a Co-Cr alloy

“…The Gaussian deconvolution of CJ and SJ spectra showed similar peaks, but SP revealed an important low-wavenumber shifting of the major SiÀ ÀOÀ ÀSi stretching peak. A possible explanation is an increased interference from the silica particles, which when applied in relative thick layers show a peak at 1090 cm À1 [23]. Peak shifting is also affected by the stress status in case of coatings [24].…”