Growth and complex characterization of nanoporous oxide layers on metallic tin during one-step anodic oxidation in oxalic acid at room temperature

Zaraska, Leszek; Bobruk, M.; Jaskuła, Marian; Sulka, Grzegorz D.

doi:10.1016/j.apsusc.2015.06.052

Cited by 35 publications

(27 citation statements)

References 40 publications

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“…The formation of such structures, being a result of a vigorous gas generation and evolution of the oxide morphology during anodizing in oxalic acid, was described and discussed in detail in our previous works [19,35]. It should be mentioned that as-obtained anodic tin oxide was amorphous (see XRD spectrum with no significant peaks, Figure 3(a)).…”

Section: Resultsmentioning

confidence: 81%

“…In our recent work, we discussed the effect of anodizing conditions on the formation and structure of anodic tin oxides formed during anodization of low-purity Sn foil in a conventional electrochemical cell with vertically aligned electrodes [35]. Here, we focus mainly on the effect of different cell geometry on the growth and morphology of nanoporous tin oxide layers and on possibilities for fabricating anodic oxides on various Sn substrates.…”

Section: Introductionmentioning

confidence: 99%

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Formation of Nanoporous Tin Oxide Layers on Different Substrates during Anodic Oxidation in Oxalic Acid Electrolyte

Zaraska

Bobruk

Sulka

2015

Advances in Condensed Matter Physics

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Nanoporous tin oxide layers were obtained on various Sn substrates including high- and low-purity foils and wire by one-step anodic oxidation carried out in a 0.3 M oxalic acid electrolyte at various anodizing potentials. In general, amorphous oxide layers with the atomic ratio of Sn : O (1 : 1) were grown during anodization, and a typical structure of the as-obtained film consists of the “outer” layer with less regular, interconnetted pores and the “inner” layer with much more uniform and regular channels formed as a result of vigorous gas evolution. It was found that the use of electrochemical cell with the sample placed horizontally on the metallic support and stabilized by the Teflon cover, instead of the typical two-electrode system with vertically arranged electrodes, can affect the morphology of as-obtained layers and allows fabrication of nanoporous oxides even at anodizing potentials up to 11 V. An average pore diameter in the “outer” oxide layer increases with increasing anodizing potential, and no significant effect of substrate purity on the structure of anodic film was proved, except better uniformity of the oxides grown on high-purity Sn. A strong linear relationship between the average steady-state current density and anodizing potential was also observed.

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Section: Resultsmentioning

confidence: 81%

Section: Introductionmentioning

confidence: 99%

Formation of Nanoporous Tin Oxide Layers on Different Substrates during Anodic Oxidation in Oxalic Acid Electrolyte

Zaraska

Bobruk

Sulka

2015

Advances in Condensed Matter Physics

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“…Among diverse methods of synthesis of nanostructured tin oxides, one of the most attractive is electrochemical oxidation (anodization) of Sn because of its simplicity, low-cost, high effectiveness, and possibility of controlling and tuning the morphology of nanostructures [24,25]. Despite extensive studies on the influence of various anodizing conditions (e.g., applied potential, electrolyte composition, process duration) on the growth and morphology of porous anodic SnO x layers, which have already been performed [24][25][26][27][28][29][30][31][32], nanostructured anodic tin oxide films have been obtained mostly on tin foils [24,26,28,30,32] or smooth Sn layers electrochemically deposited on conductive supports [25,27]. To the best of our knowledge, no researches concerning possibilities of fabrication of nanoporous SnO x on micro/nano-structured metallic substrates have been reported, except the approach proposed by Wu et al [33] based on the oxidation of Sn nanowire arrays prepared using template-assisted electrodeposition.…”

Section: Introductionmentioning

confidence: 99%

Hierarchical Nanoporous Sn/SnOx Systems Obtained by Anodic Oxidation of Electrochemically Deposited Sn Nanofoams

et al. 2020

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A simple two-step electrochemical method for the fabrication of a new type of hierarchical Sn/SnOx micro/nanostructures is proposed for the very first time. Firstly, porous metallic Sn foams are grown on Sn foil via hydrogen bubble-assisted electrodeposition from an acidulated tin chloride electrolyte. As-obtained metallic foams consist of randomly distributed dendrites grown uniformly on the entire metal surface. The estimated value of pore diameter near the surface is ~35 µm, while voids with a diameter of ~15 µm appear in a deeper part of the deposit. Secondly, a layer of amorphous nanoporous tin oxide (with a pore diameter of ~60 nm) is generated on the metal surface by its anodic oxidation in an alkaline electrolyte (1 M NaOH) at the potential of 4 V for various durations. It is confirmed that if only optimal conditions are applied, the dendritic morphology of the metal foam does not change significantly, and an open-porous structure is still preserved after anodization. Such kinds of hierarchical nanoporous Sn/SnOx systems are superhydrophilic, contrary to those obtained by thermal oxidation of metal foams which are hydrophobic. Finally, the photoelectrochemical activity of the nanostructured metal/metal oxide electrodes is also presented.

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“…When forming 1D nanostructures using this method, properties such as the pore diameter, length, and pore-wall thickness can be easily adjusted by controlling the anodizing conditions (e.g., voltage, time, electrolyte composition, temperature, etc.) [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16]. Since the anodic formation of a 1D tin oxide nanoporous structure was reported [1], recent studies have focused on changing the anodizing conditions to control the nanoporous structure of 1D tin oxide, and on applying the same methodology to the elec-trode materials used in high-performance semiconductor-type gas sensors [3,4,13] and energy storage devices [7,12].…”

Section: Introductionmentioning

confidence: 99%

Crystallization of Mesoporous Tin Oxide Prepared by Anodic Oxidation

Kim¹,

Shin²

2017

J. Electrochem. Sci. Technol

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Crystallization of one-dimensional porous tin oxide during the anodic oxidation of tin at ambient temperatures is reported. Remarkable crystallinity is achieved when a substrate with a high elastic modulus (e.g., silicon) is used and the tin coating on it is very thin. It is suggested that the compressive stress applied to the anodic tin oxide during the anodization process is the key factor affecting the degree of crystallinity. The measured value of the stress generated during anodization matches well with the range of the most favorable theoretical pressure (stress) for crystallization.

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Growth and complex characterization of nanoporous oxide layers on metallic tin during one-step anodic oxidation in oxalic acid at room temperature

Cited by 35 publications

References 40 publications

Formation of Nanoporous Tin Oxide Layers on Different Substrates during Anodic Oxidation in Oxalic Acid Electrolyte

Formation of Nanoporous Tin Oxide Layers on Different Substrates during Anodic Oxidation in Oxalic Acid Electrolyte

Hierarchical Nanoporous Sn/SnOx Systems Obtained by Anodic Oxidation of Electrochemically Deposited Sn Nanofoams

Crystallization of Mesoporous Tin Oxide Prepared by Anodic Oxidation

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