Growth and photocatalytic properties of one-dimensional ZnO nanostructures prepared by thermal evaporation

Photocatalysis and Bandgap Engineering Using ZnO Nanocomposites

“…They used them for the photodegradation of RhB and showed size/shape dependent photocatalytic activity. Yan et al grew films of ZnO nanoneedles, NPs, and flower-like structures and used them for decomposition of methyl blue under the principle of photocatalysis [120]. The efficiency of photocatalysis depends upon harvested region of the solar spectrum by ZnO nanostructures and the lifetime of the generated electron-hole pair.…”

Conventional versus lattice photocatalysed reactions: Implications of the lattice oxygen participation in the liquid phase photocatalytic oxidation with nanostructured ZnO thin films on reaction products and mechanism at both 254nm and 340nm

“…Furthermore, previous studies [3,[5][6][7][8] have shown that ZnO is a promising candidate among other metal oxides such as TiO 2 , SnO 2 , ZrO 2 , ␣-Fe 2 O 3 , WO 3 , CdS and ZnS. ZnO has been used as a photocatalyst as a powder [9][10][11][12] and as supported thin films [13][14][15][16]. Most studies have focused on the characterisation of the photocatalytic nature of ZnO [9][10][11][12][13][14][15][16].…”

“…ZnO has been used as a photocatalyst as a powder [9][10][11][12] and as supported thin films [13][14][15][16]. Most studies have focused on the characterisation of the photocatalytic nature of ZnO [9][10][11][12][13][14][15][16]. Fewer studies have focussed on reaction intermediate and product quantification and analysis [1,[17][18][19], with fewer still aiming to determine the impact and relationship of the photocatalyst surface and solution reactions to this reaction intermediate and product spectrum.…”

Моделирование Процесса Резистивного Динамического Испарения В Вакууме

“…Экспе-риментальное определение значений параметров таких режимов представляет собой очень сложную и доро-гую операцию, поэтому актуальным является создание моделей, описывающих процессы термовакуумного ис-парения и учитывающих особенности конкретного типа испарителя [12][13][14][15][16][17][18][19][20][21][22]. Таким образом, целью настоящей работы является создание модели процесса резистив-ного динамического испарения в вакууме, учитываю-щей особенности конструкции испарителя, описанного в работе [11] и свободного от перечисленных ранее недостатков.…”