“…These advantages can be utilised in several applications such as: thin film solar cells, light emitting diodes and electroluminescent devices [4] , antireflection coatings and optical filters [5] . There are many techniques such as pulsed-laser deposition (PLD), sputtering [6] , chemical vapour deposition (CVD) [7] , molecular beam epitaxial (MBE) [8] , atomic layer epitaxial (ALE) [9] , thermal evaporation [10] , as well as spray pyrolysis [11] , sol-gel [12] , electro-deposition [13] and chemical bath deposition (CBD) [14] have been used to fabrication ZnS thin films. However, compared to the other deposition method, ultrasonic spray is widely used for the synthesis of nano-materials and high quality thin films and known as the most suitable method for preparing thin layers of ZnS, due to it beingeconomical, simple, feasible, flex-ible, cost effective, convenient for large-area deposition at low temperatures and it allows easy deposition in the atmospheric condition.…”