2014
DOI: 10.1016/j.tsf.2013.05.150
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Growth and properties of ZnO films on polymeric substrate by spray pyrolysis method

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Cited by 13 publications
(4 citation statements)
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“…These advantages can be utilised in several applications such as: thin film solar cells, light emitting diodes and electroluminescent devices [4] , antireflection coatings and optical filters [5] . There are many techniques such as pulsed-laser deposition (PLD), sputtering [6] , chemical vapour deposition (CVD) [7] , molecular beam epitaxial (MBE) [8] , atomic layer epitaxial (ALE) [9] , thermal evaporation [10] , as well as spray pyrolysis [11] , sol-gel [12] , electro-deposition [13] and chemical bath deposition (CBD) [14] have been used to fabrication ZnS thin films. However, compared to the other deposition method, ultrasonic spray is widely used for the synthesis of nano-materials and high quality thin films and known as the most suitable method for preparing thin layers of ZnS, due to it beingeconomical, simple, feasible, flex-ible, cost effective, convenient for large-area deposition at low temperatures and it allows easy deposition in the atmospheric condition.…”
Section: Introductionmentioning
confidence: 99%
“…These advantages can be utilised in several applications such as: thin film solar cells, light emitting diodes and electroluminescent devices [4] , antireflection coatings and optical filters [5] . There are many techniques such as pulsed-laser deposition (PLD), sputtering [6] , chemical vapour deposition (CVD) [7] , molecular beam epitaxial (MBE) [8] , atomic layer epitaxial (ALE) [9] , thermal evaporation [10] , as well as spray pyrolysis [11] , sol-gel [12] , electro-deposition [13] and chemical bath deposition (CBD) [14] have been used to fabrication ZnS thin films. However, compared to the other deposition method, ultrasonic spray is widely used for the synthesis of nano-materials and high quality thin films and known as the most suitable method for preparing thin layers of ZnS, due to it beingeconomical, simple, feasible, flex-ible, cost effective, convenient for large-area deposition at low temperatures and it allows easy deposition in the atmospheric condition.…”
Section: Introductionmentioning
confidence: 99%
“…The subject related to the applications of ZnO was boosted with the advantage of the easy synthesis process compared to the other competitive compounds, such as gallium nitride (GaN) and silicon carbide (SiC). Moreover, ZnO can be synthesised through different processes, and films were grown on different low-cost substrates, such as ordinary papers [18], polymers [19,20], slide glasses [15], and silicon wafers [10]. Furthermore, high-quality ZnO can be prepared using simple methods with repeatable characteristics, including methods such as radio frequency (RF) magnetron sputtering [21], low temperature hydrothermal processes [22,23], thermal evaporation [24,25], sol-gel [26], electrodeposition [27], and chemical vapour deposition (CVD) [28].…”
Section: Introductionmentioning
confidence: 99%
“…The minimum requirement for the transparency of the optical window material has been reported to be 70% . Another important optical parameter that indicates the ability of the material scatter the light is haze factor approach . The haze factor vs. wavelength spectra for the ZnS layers deposited at different growth temperatures are presented in figure .…”
Section: Resultsmentioning
confidence: 99%