“…The growth of the In 1−x Ga x As y Sb 1−y QDs is based on the Stranski-Krastanov mode [59] and requires a few-ML-thick GaAs interlayer, which will be denoted here as IL. The growth of such material system has been previously studied by Sala et al in [46,57,60]. The growth procedure starts with a 250 nm GaP buffer layer, followed by a 20 nm Al 0.4 Ga 0.6 P layer providing a barrier for the photogenerated charge carriers, and 150 nm GaP at a temperature of 750 • C. The substrate temperature is then reduced to 500 • C and the following steps are carried out: (i) growth of a 5 ML-thick GaAs interlayer, required for QD formation [46,57], (ii) a short Sb-flush by supplying Triethylantimony for the QD samples S with and S cap , with a flux of 2.6 µmol/min, (iii) ∼ 0.51 ML In 1−x Ga x As y Sb 1−y QDs, (iv) a 1 ML thick GaSb cap for the sample S cap , (v) a growth interruptions (GRI) of 1 s without any precursor supply, and (vi) an additional GaP cap layer ∼ 6 nm thick (thickness optimized to maximize PL intensity of the structure, see Sect.…”