Niobium
(Nb) is a promising refractory metal with a wide variety
of technological applications in nanoelectronics, optoelectronics,
photonics, and energy-related technologies. However, to further advance
the field of nanoelectronics and nanophotonics, very high-quality
Nb films with excellent structural order are needed. While much progress
has been made in understanding the heteroepitaxy of Nb on oxide substrates,
the underlying fundamental mechanisms, especially to realize films
showing abrupt interfaces with the substrate and without needing the
expensive equipment and/or processing under extreme conditions, remain
a challenge. In this context, herein, we demonstrate an approach to
stabilize the epitaxial, nanocolumnar bcc Nb films with highly ordered
and abrupt interfaces on YSZ(001) substrates using simple and industrially
widely adopted sputter deposition. 90 nm Nb films deposited onto YSZ(001)
at 500 °C exhibit a strained, epitaxial structure. As evidenced
in X-ray diffraction and transmission electron microscopy analyses,
the structural quality of Nb films is driven by substrate-assisted
selective nanocrystallization. Coupled with granular morphology and
high structural quality, the optical properties measured by spectroscopic
ellipsometry and reflectivity indicate highly reflective Nb films
with enhanced optical constants. Corroborated with surface/interface
quality, microstructure, and optical properties, the epitaxial Nb
films exhibit excellent mechanical characteristics. The hardness and
elastic modulus of the Nb epitaxial films were 18 and 240 GPa, respectively,
which are attributed primarily to the growth of a compact nanocolumnar
Nb epitaxial film on YSZ.