Growth behavior near the ultimate resolution of nanometer-scale focused electron beam-induced deposition

Dorp, Willem F. van; Hagen, C. W.; Crozier, Peter; Kruit, P.

doi:10.1088/0957-4484/19/22/225305

Cited by 47 publications

(65 citation statements)

References 17 publications

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“…The choice of these three molecules was predicated on their widespread use by the EBID community as precursors, and our understanding of the purely electron stimulated decomposition process. 7,8,10,11,16,19,[21][22][23][24][25][26][27][28][29][30][31][32] In addition, our results can be compared and benchmarked against compositional data that already exist from previous EBID studies where deposition was accomplished under more typical conditions. Our experimental approach involved exposing nanometer thick films of parent precursor molecules to different electron fluences.…”

Section: Introductionmentioning

confidence: 99%

Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

Rosenberg

Landheer

Hagen

et al. 2012

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Using three different precursors [MeCpPtMe 3 , Pt(PF 3 ) 4 , and W(CO) 6 ], an ultra-high vacuum surface science approach has been used to identify and rationalize the effects of substrate temperature and electron fluence on the chemical composition and bonding in films created by electron beam induced deposition (EBID). X-ray photoelectron spectroscopy data indicate that the influence of these two processing variables on film properties is determined by the decomposition mechanism of the precursor. For precursors such as MeCpPtMe 3 that decompose during EBID without forming a stable intermediate, the film's chemical composition is independent of substrate temperature or electron fluence. In contrast, for Pt(PF 3 ) 4 and W(CO) 6 , the initial electron stimulated deposition event in EBID creates surface bound intermediates Pt(PF 3 ) 3 and partially decarbonylated W x (CO) y species, respectively. These intermediates can react subsequently by either thermal or electron stimulated processes. Consequently, the chemical composition of EBID films created from either Pt(PF 3 ) 4 or W(CO) 6 is influenced by both the substrate temperature and the electron fluence. Higher substrate temperatures promote the ejection of intact PF 3 and CO ligands from Pt(PF 3 ) 3 and W x (CO) y intermediates, respectively, improving the film's metal content. However, reactions of Pt(PF 3 ) 3 and W x (CO) y intermediates with electrons involve ligand decomposition, increasing the irreversibly bound phosphorous content in films created from Pt(PF 3 ) 4 and the degree of tungsten oxidation in films created from W(CO) 6 . Independent of temperature effects on chemical composition, elevated substrate temperatures (>25 C) increased the degree of metallic character within EBID deposits created from MeCpPtMe 3 and Pt(PF 3 ) 4 .

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Section: Introductionmentioning

confidence: 99%

Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

Rosenberg

Landheer

Hagen

et al. 2012

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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“…In this way, two-and three-dimensional nanoscale structures can be deposited at a resolution of Ϸ1.0 nm. 4,5 Current applications of FEBIP include photolithographic mask repair and the production of high aspect ratio scanning probe tips. [6][7][8][9][10][11][12][13][14] Future applications may include the fabrication of nanoelectronic components.…”

Section: Introductionmentioning

confidence: 99%

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

Wnuk

Gorham

Rosenberg

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Focused electron beam induced processing ͑FEBIP͒ of volatile organometallic precursors has become an effective and versatile method of fabricating metal-containing nanostructures. However, the electron stimulated decomposition process responsible for the growth of these nanostructures traps much of the organic content from the precursor's ligand architecture, resulting in deposits composed of metal atoms embedded in an organic matrix. To improve the metallic properties of FEBIP structures, the metal content must be improved. Toward this goal, the authors have studied the effect of atomic hydrogen ͑AH͒ and atomic oxygen ͑AO͒ on gold-containing deposits formed from the electron stimulated decomposition of the FEBIP precursor, dimethyl-͑acetylacetonate͒ gold͑III͒, Au III ͑acac͒Me 2 . The effect of AH and AO on nanometer thick gold-containing deposits was probed at room temperature using a combination of x-ray photoelectron spectroscopy ͑XPS͒, scanning Auger electron spectroscopy, and atomic force microscopy ͑AFM͒. XPS revealed that deposits formed by electron irradiation of Au III ͑acac͒Me 2 are only Ϸ10% gold, with Ϸ80% carbon and Ϸ10% oxygen. By exposing deposits to AH, all of the oxygen atoms and the majority of the carbon atoms were removed, ultimately producing a deposit composed of Ϸ75% gold and Ϸ25% carbon. In contrast, all of the carbon could be etched by exposing deposits to AO, although some gold atoms were also oxidized. However, oxygen was rapidly removed from these gold oxide species by subsequent exposure to AH, leaving behind purely metallic gold. AFM analysis revealed that during purification, removal of the organic contaminants was accompanied by a decrease in particle size, consistent with the idea that the radical treatment of the electron beam deposits produced close packed, gold particles. The results suggest that pure metallic structures can be formed by exposing metal-containing FEBIP deposits to a sequence of AO followed by AH.

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“…With this approach and by applying low electron doses, extremely small deposits could be realized. [14][15][16][17] With electron beam induced surface activation (EBISA), we have recently introduced a FEBIP technique, where no FSE proximity effect occurs. 18,19 Figure 1 schematically depicts the ideal two step EBISA process: In the first step, the surface is irradiated and thereby locally activated with a focused electron beam; in the second step, it is exposed to the precursor iron pentacarbonyl, Fe(CO) 5 .…”

mentioning

confidence: 99%

Investigation of proximity effects in electron microscopy and lithography

Walz

Vollnhals

Rietzler

et al. 2012

Applied Physics Letters

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A novel apparatus for in situ compression of submicron structures and particles in a high resolution SEM Rev. Sci. Instrum. 83, 095105 (2012) Foucault imaging by using non-dedicated transmission electron microscope Appl. Phys. Lett. 101, 093101 (2012) New Products Rev. Sci. Instrum. 83, 079501 (2012) Towards secondary ion mass spectrometry on the helium ion microscope: An experimental and simulation based feasibility study with He+ and Ne+ bombardment

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Growth behavior near the ultimate resolution of nanometer-scale focused electron beam-induced deposition

Cited by 47 publications

References 17 publications

Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

Investigation of proximity effects in electron microscopy and lithography

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