2002
DOI: 10.1002/1616-3028(20020418)12:4<250::aid-adfm250>3.0.co;2-l
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Growth Behavior of Cubic Boron Nitride Films in a Two-Step Process: Changing Bias Voltage, Gas Composition, and Substrate Temperature

Abstract: In the deposition of cubic boron nitride (cBN) films by DC‐bias‐assisted DC jet chemical vapor deposition in an Ar–N2–BF3–H2 gas system, the balance between growth and etching and its relation to the deposition conditions were investigated. A two‐step process was designed to optimize the nucleation and growth separately, and a critical bias voltage for the growth of cBN after nucleation was observed. It was found that etching occurred when the bias voltage was below this critical value. Under optimized conditi… Show more

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Cited by 19 publications
(6 citation statements)
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“…Faceted cBN films can be obtained using a two-step approach (i.e. reducing substrate bias voltage and increasing substrate temperature when switched from the nucleation to the growth process), as illustrated in figure 12 [155][156][157]. These cBN films were textured with their [0 0 1] orientation perpendicular to the film surface as revealed by pole-figure xray diffraction.…”
Section: Growth Of Cbn Via Chemical Routementioning
confidence: 99%
“…Faceted cBN films can be obtained using a two-step approach (i.e. reducing substrate bias voltage and increasing substrate temperature when switched from the nucleation to the growth process), as illustrated in figure 12 [155][156][157]. These cBN films were textured with their [0 0 1] orientation perpendicular to the film surface as revealed by pole-figure xray diffraction.…”
Section: Growth Of Cbn Via Chemical Routementioning
confidence: 99%
“…Boron nitride exists in different polytypes, the sp 2 bonded hexagonal and rhombohedral structures and the sp 3 cubic and wurzite phases. 1,2 Hexagonal and cubic BN are analogous to graphite and diamond, respectively. All phases are wide band-gap semiconductors ͑Ͼ5 eV͒.…”
Section: Introductionmentioning
confidence: 99%
“…There have also been complex examples using mixtures of reactive carrier gases such as (e.g. Ar-N 2 -BF 3 -H 2 ) (Zhang et al 2002) 1.3.3 Adsorption of the precursor onto the hot substrate. The hot surface required for CVD is essential to overcome the energy barrier of reaction.…”
Section: Transport Delivering the Precursor Into The Reaction Chambermentioning
confidence: 45%