1994
DOI: 10.1016/0040-6090(94)90486-3
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Growth of GaSe layered compound on a GaAs (001) surface

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Cited by 13 publications
(3 citation statements)
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“…The weakness of this interaction explains the existence of a number of polytypes [4]. Ga 50 Se 50 alloys can be prepared by the melting, vapour deposition and molecular beam epitaxy techniques [5][6][7][8]. These techniques have had very limited success because they do not have control over the kinetics and morphology.…”
Section: Introductionmentioning
confidence: 99%
“…The weakness of this interaction explains the existence of a number of polytypes [4]. Ga 50 Se 50 alloys can be prepared by the melting, vapour deposition and molecular beam epitaxy techniques [5][6][7][8]. These techniques have had very limited success because they do not have control over the kinetics and morphology.…”
Section: Introductionmentioning
confidence: 99%
“…A fairly general trend in vdW epitaxy. [50] The epitaxy by MBE of bulk PTMCs has been reported without constancy since the 1990s [51][52][53][54][55][56] and unfortunately, most of them reported only the homoepitaxy, or then, the standard heteroepitaxy on GaAs substrates, which results in rough interfaces and growth in other orientations than the [0001], which cannot be directly applied to form the atomic defined interfaces as required for QWs and SLs. Only recently, Sorokin demonstrate the growth of GaTe/ GaSe [49,57] heterostructures that could be used for this goal, however, up to now, no one succeed to grow high-quality InSe/ GaSe heterostructures or to demonstrated quantum confinement on PTMC large-area heterostructures.…”
Section: Introductionmentioning
confidence: 99%
“…The weakness of this interaction explains the existence of a number of polytypes [4]. Ga 50 Se 50 alloys can be prepared by the melting, vapor deposition and molecular beam epitaxy techniques [5,6,7,8]. These techniques have had very limited success because they do not have control over the kinetics and morphology.…”
mentioning
confidence: 99%