2013
DOI: 10.1166/mex.2013.1132
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Growth of indium nitride nanopetal structures on indium oxide buffer layer

Abstract: This paper presents a simple method for controlling crystalline quality and morphology of InN. A buffer layer of indium oxide is deposited in-situ on Si substrate before growing InN by atmospheric pressure-halide vapour phase epitaxy. Glancing angle X-ray diffraction and scanning electron microscopic studies have been carried out. Buffer layer of indium oxide helps in the growth of indium nitride nanopetals.

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Cited by 3 publications
(2 citation statements)
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“…Nano-petal structures (Figure 3(a)) which were formed according to proposed ‘gaseous model’ [12,20] as a result of bubbles bursting of low-melting components were ascribed to InN. Similar nano-petals InN structures were demonstrated in nitrogen and ammonia flow during the growth of InN on In 2 O 3 buffer layer [23] and during combined thermal/UV photo-assisted process [22].…”
Section: Resultsmentioning
confidence: 94%
“…Nano-petal structures (Figure 3(a)) which were formed according to proposed ‘gaseous model’ [12,20] as a result of bubbles bursting of low-melting components were ascribed to InN. Similar nano-petals InN structures were demonstrated in nitrogen and ammonia flow during the growth of InN on In 2 O 3 buffer layer [23] and during combined thermal/UV photo-assisted process [22].…”
Section: Resultsmentioning
confidence: 94%
“…Finally, further disintegration of these products will lead to the formation of In 2 O 3 and H 2 O. Moreover, the released N 2 O 5 gas will decompose gradually into nitrogen dioxide (NO 2 ) gas even at room temperature [22]. The possible reactions for the formation of In 2 O 3 can be expressed as follows [20]: …”
Section: Resultsmentioning
confidence: 99%