A novel and simple procedure named photocalcination has been developed for removing
organic components from mesostructured organic−inorganic composite films. This procedure
employs an excimer lamp radiating vacuum ultraviolet (VUV) light of 172 nm in wavelength.
Organic molecules are removed through two distinct photochemical reactions proceeding
simultaneously at room temperature: the photocleavage of C−H and C−C bonds in the
organic molecules by direct photoexcitation and their subsequent oxidation with activated
oxygen species generated by the photoexcitation of atmospheric oxygen molecules. In this
study, a composite of cetyltrimethylammonium chloride−silica (CTAC−silica) was used. Thin
films of this organic−inorganic composite were prepared on Si substrates coated with a self-assembled monolayer of octadecyltrimethoxysilane. The films were irradiated with VUV light
under pressures of 10, 102, 103, or 105 Pa. Although, in each case, the CTAC molecules in
the composite films were completely oxidized and removed, the elimination rate increased
with an increase in the photocalcination pressure. While 3 h of irradiation was necessary to
completely remove the CTAC molecules at 10 Pa, only 0.5 h was required at 105 Pa. However,
the periodic mesostructures of the film photocalcined at 105 Pa distorted significantly because
of the rapid photooxidation. As a control experiment, identical CTAC−silica mesocomposite
films were calcined thermally. The films were heated in air at temperatures from 373 to
773 K. Although the CTAC molecules could be eliminated completely at temperatures higher
than 573 K, the periodic mesostructures of the thermocalcined films were much more
distorted than those of the photocalcined films.