2010
DOI: 10.1016/j.jallcom.2009.09.098
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Growth of non-polar ZnO films on a-GaN/r-Al2O3 templates by radio-frequency magnetron sputtering

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Cited by 17 publications
(10 citation statements)
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“…The polarization effects can be minimized by growing wurtzite materials on non-polar [4] or semi-polar planes [5]. In the reported literature, most of the studies on non-polar/semi-polar ZnO-based films have been performed on single crystal substrates such as ZnO [6,7], Al 2 O 3 [8][9][10][11] and LaAlO 3 [12], where substrate-guided epitaxial growth is dominant. However, it is highly desirable to develop a more convenient and economical way to produce non-polar/semi-polar ZnO-based films through the fabrication of self-textured film on inexpensive amorphous surfaces.…”
Section: Introductionmentioning
confidence: 99%
“…The polarization effects can be minimized by growing wurtzite materials on non-polar [4] or semi-polar planes [5]. In the reported literature, most of the studies on non-polar/semi-polar ZnO-based films have been performed on single crystal substrates such as ZnO [6,7], Al 2 O 3 [8][9][10][11] and LaAlO 3 [12], where substrate-guided epitaxial growth is dominant. However, it is highly desirable to develop a more convenient and economical way to produce non-polar/semi-polar ZnO-based films through the fabrication of self-textured film on inexpensive amorphous surfaces.…”
Section: Introductionmentioning
confidence: 99%
“…Triple-axis x-ray diffraction measurements conclude that the Mg incorporation should increase the χ (2) under optical frequency electric field by strengthening electronic polarization rather than increasing the residual strain in the film. Furthermore, the annealed Zn 0.72 Mg 0.28 O exhibits an increase of 48% in laser-induced surface-damage threshold relative to [11][12][13][14][15][16][17][18][19][20] ZnO crystals. These findings open the way of the Zn 0.72 Mg 0.28 O thin films to ultrafast nonlinear optical devices.…”
mentioning
confidence: 95%
“…Therefore, it is important to seek solutions to mitigate the large lattice mismatch between ZnO and sapphire substrate to grow high-quality a-plane ZnO epilayers. Considering that GaN has a small lattice mismatch with ZnO (0.4% for the c-axis and 1.9% for the a-axis) and similar thermal expansion coefficients [7], it is considered as one of the best buffer layers [8][9][10]. However, GaN buffer layers and ZnO epilayers are grown by different techniques.…”
Section: Introductionmentioning
confidence: 99%