2003
DOI: 10.1016/s0022-0248(02)02528-9
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Growth of PbSe thin films on Si substrates by pulsed laser deposition method

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Cited by 41 publications
(15 citation statements)
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“…Generally, the composition and microstructure of the PbSe thin films can be varied by changing the preparation methods and corresponding parameters. Until now, the PbSe thin films have been successfully prepared by many chemical, electrochemical and physical methods, such as chemical bath deposition [17], electrochemical deposition [10], thermal evaporation [18], pulsed laser deposition [19] and molecular beam epitaxy [20], etc. In recent years, magnetron sputtering has been widely used to prepare semiconductor thin films due to its low cost, easy handling and high quality products compared with other preparation methods [21].…”
Section: Introductionmentioning
confidence: 99%
“…Generally, the composition and microstructure of the PbSe thin films can be varied by changing the preparation methods and corresponding parameters. Until now, the PbSe thin films have been successfully prepared by many chemical, electrochemical and physical methods, such as chemical bath deposition [17], electrochemical deposition [10], thermal evaporation [18], pulsed laser deposition [19] and molecular beam epitaxy [20], etc. In recent years, magnetron sputtering has been widely used to prepare semiconductor thin films due to its low cost, easy handling and high quality products compared with other preparation methods [21].…”
Section: Introductionmentioning
confidence: 99%
“…PbSe has wide applications in long and mid-wavelength infrared detectors, optical amplifiers, mid-infrared lasers, as thermoelectric materials, and as Pb 2+ ion selective sensors [ 4 7 ]. Among the various techniques used to prepare PbSe thin films, such as vacuum evaporation [ 8 ], microwave heating [ 9 ], pulsed laser deposition [ 10 ], electrochemical atomic layer epitaxy [ 11 ], and electrodeposition [ 12 ], the chemical bath deposition method [ 13 14 ] is relatively simple and cost-effective, and has the advantage that it allows control over deposition parameters such as the pH, the concentration of ions, deposition temperature, etc., with great ease.…”
Section: Introductionmentioning
confidence: 99%
“…Several techniques are used for synthesis of PbSe, including the photochemical approach [18], sonochemical method [19], atomic layer epitaxy technique [20], pulsed laser deposition method [21], CBD approach [22], vacuum deposition method [23], electrodeposition technique [24], pulse sonochemical approach [25], SILAR [26], as well as aerosolassisted chemical vapor deposition (AACVD) [27]. Every method has its advantages and disadvantages, structure, and surface morphology; all optoelectronic features rely heavily on the preparation approaches.…”
Section: Introductionmentioning
confidence: 99%