2008
DOI: 10.1007/s12200-008-0024-2
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Growth of phosphorus-doped p-type ZnO thin films by MOCVD

Abstract: Phosphorus-doped p-type ZnO thin films are prepared on glass substrates by metalorganic chemical vapor deposition (MOCVD). DEZn, O 2 , and P 2 O 5 powders are used as reactant and dopant sources. The ptype ZnO films are grown at a temperature between 673 K and 723 K. The best p-type sample has a low resistivity of 4.64 V?cm, a hole concentration of 1.61 6 10 18 cm 23 , and a Hall mobility of 0.838 cm 2 ?(V?s) 21 at room temperature. A strong emission peak at 3.354 eV corresponding to neutral acceptor bound exc… Show more

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