Growth of poly-crystalline Cu films on Y substrates by picosecond pulsed laser deposition for photocathode applications

Gontad, F.; Lorusso, A.; Klini, A.; Manousaki, A.; Perrone, A.; Fotakis, C.

doi:10.1016/j.nima.2015.07.041

Cited by 6 publications

(3 citation statements)

References 31 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The similarity of the two plots reveals that the spot size dependence is real and characteristic of the lasers of this class. The 3–4 times higher growth rates of magnitude 0.1 nm/pulse reported in our case are impressive even in comparison with the literature’s data [ 40 , 49 , 51 ]. What makes a difference is that the early version of the laser system [ 40 ] definitely possessed lower energy contrast due to the single-pass on-axis amplification scheme.…”

Section: Discussionsupporting

confidence: 85%

“…Therefore, the excellent agreement in the ablation thresholds reported at F th = 0.50 ± 0.05 J/cm 2 [ 42 , 43 , 44 , 45 , 46 ] is reasonable. Nevertheless, material removal at extremely low rates, slowly increasing with fluence was shown to be possible even below 0.5 J/cm 2 [ 47 , 48 , 49 ], while 0.35 and 0.15 J/cm 2 were derived as thresholds in 500 fs@248 nm PLD [ 40 , 50 ].…”

Section: Discussionmentioning

confidence: 99%

“…In the process parameter domain covered in this study, the ablated material is predominately decomposed as nanoparticles, with atoms and ions as minor components e.g., [ 24 , 52 ]. As evidenced by SEM/AFM mapping, the morphology of the films resembles the surface of copper films deposited by pulses of 5 ps duration@248 nm [ 49 ]. The reason for the presence of relatively large sized particles in the films is their origin: they are ejected directly from the molten target surface [ 47 ].…”

Section: Discussionmentioning

confidence: 99%

See 2 more Smart Citations

Sub-ps Laser Deposited Copper Films for Application in RF Guns

et al. 2023

View full text Add to dashboard Cite

Copper thin films are intended to serve as a cover layer of photocathodes that are deposited by ablating copper targets in a high vacuum by temporally clean 600 fs laser pulses at 248 nm. The extremely forward-peaked plume produced by the ultrashort UV pulses of high-energy contrast ensures fast film growth. The deposition rate, defined as peak thickness per number of pulses, rises from 0.03 to 0.11 nm/pulse with an increasing ablated area while keeping the pulse energy constant. The material distribution over the surface-to-be-coated can also effectively be controlled by tuning the dimensions of the ablated area: surface patterning from airbrush-like to broad strokes is available. The well-adhering films of uniform surface morphology consist of densely packed lentil-like particles of several hundred nm in diameter and several ten nm in height. Task-optimized ultrashort UV laser deposition is thereby an effective approach for the production of thin film patterns of predetermined geometry, serving e.g., as critical parts of photocathodes.

show abstract