Growth of thin aluminium oxide films on stainless steel by MOCVD at ambient pressure and by using a hot-wall CVD-setup

Pflitsch, Christian; Muhsin, Ali; Bergmann, Ulf; Atakan, Burak

doi:10.1016/j.surfcoat.2005.10.036

Cited by 39 publications

(28 citation statements)

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“…We recently reported the CVD growth of pure aluminum oxide films, without doping, using aluminum acetylacetonate as the precursor and oxygen as the reactive gas. [23,24] While films grown at low temperatures are amorphous, films deposited at T >973 K are crystalline. For the deposition of the a-phase of Al 2 O 3 , which is the host material of ruby, even temperatures above 1273 K are necessary.…”

Section: Introductionmentioning

confidence: 99%

“…For the deposition of the a-phase of Al 2 O 3 , which is the host material of ruby, even temperatures above 1273 K are necessary. Short residence times of the precursors in the reactor have to be used to avoid precursor depletion, which starts around 600 K, [23] so high gas flow velocities and a stagnation point flow geometry embedded in a cold-wall reactor set-up is used in the present study (see also Pflitsch et al [24] ).…”

Section: Introductionmentioning

confidence: 99%

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CVD of Thin Ruby Films on Si(100) and Stainless Steel for Surface Temperature Sensor Applications

Pflitsch¹,

Viefhaus²,

Atakan³

2007

Chemical Vapor Deposition

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Surface temperature measurements are crucial in many applications; one promising approach is the use of thermographic phosphors. The temperatures of surfaces coated with such a material can easily be detected by measuring and evaluating the luminescence. In the present study, the CVD of chromium-doped aluminum oxide films (ruby) on Si(100) and stainless steel substrates is investigated with respect to this application. Films are deposited in a cold-wall reactor from oxygen and the acetylacetonates of aluminum and chromium under pressures between 200 hPa (200 mbar) and 240 hPa, and at temperatures between 1273 K and 1473 K. The growth of aluminum oxide, containing 1 % chromium, is confirmed by X-ray diffraction (XRD), scanning electron microscopy (SEM), and energy dispersive X-ray (EDX) spectroscopy. While films grown at 1273 K are mainly c-Al 2 O 3 and h-Al 2 O 3 , a-Al 2 O 3 films are grown at higher temperatures. The films are analyzed by laser excitation with regard to the temperature-dependent luminescence. The films consisting of mainly a-Al 2 O 3 are promising as temperature sensors, they show the typical phosphorescence of ruby, with phosphorescence lifetimes between 2.3 ms at 298 K and 6 ls at 813 K.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

CVD of Thin Ruby Films on Si(100) and Stainless Steel for Surface Temperature Sensor Applications

Pflitsch¹,

Viefhaus²,

Atakan³

2007

Chemical Vapor Deposition

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“…The R dep of highly oriented ¡-Al 2 O 3 films showed a maximum value of R dep = 42¯m·h ¹1 at T dep = 965 K, about 50 times greater than that reported in conventional thermal CVD. 21),24)26) In the present LCVD process, simultaneous laser irradiation to precursor gases and substrate activates precursor species to form plasma around the substrate during deposition process.…”

Section: Resultsmentioning

confidence: 99%

Orientation control of .ALPHA.-Al2O3 films prepared by laser chemical vapor deposition using a diode laser

You

Ito

et al. 2010

J. Ceram. Soc. Japan

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(006)-, (104)-and (012)-oriented ¡-Al 2 O 3 films in a single phase were prepared by laser chemical vapor deposition (LCVD) using a diode laser. The effects of laser power (P L ), deposition temperature (T dep ) and total pressure (P tot ) on the crystal phase, orientation, microstructure and deposition rate (R dep ) were investigated. The orientation of ¡-Al 2 O 3 films changed from (006) to (104) to (012) with increasing P L . Higher oriented films were deposited at a lower P tot . The microstructure of ¡-Al 2 O 3 films changed from a cauliflower-like structure to a hexagonal faceted structure to a pyramid-like structure with increasing P L . The R dep of oriented ¡-Al 2 O 3 films slightly increased from 30 to 40¯m·h ¹1 with decreasing P L , which was about 50 times greater than that of conventional thermal CVD.

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“…Both images show the top view of the samples. However, before the deposition of titanium by CVA and the oxidation process, the clean stainless steel had a shining silver colored surface and small islands were observed which are separated by small trenches of 1-2 µm depth [24]. After the formation of TiO 2 the color of the substrate changed: green colored areas are seen and the trenches between the islands have nearly disappeared, also indicating the covering film.…”

Section: Cavitation Erosion Test Experimentsmentioning

confidence: 99%

Study of Cavitation Erosion Experiments on Thermally Oxidized Rutile Phase TiO<SUB>2</SUB> Films on Stainless Steel

Nebatti¹,

Pflitsch²,

Brors³

et al. 2017

MATERIALS

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A technique to deposit titanium films with rutile-TiO 2 layer at the top was carried out in two steps: the deposition of titanium by means of cathodic vacuum arc (CVA) followed by a thermal oxidation technique was investigated. As a result, well adhering rutile films occurred in the near surface region. The uncoated and coated substrates were investigated using X-ray diffraction (XRD) and energy dispersive x-ray spectroscopy (EDX). The presence of rutile phase titanium dioxide and titanium metal was confirmed by XRD. Cavitation erosion was used to investigate the protective adhesion properties of these coatings. Cavitation erosion tests confirmed that rutile TiO 2 films with a Ti inter layer adhere well to stainless steel substrates and protect the substrate from erosion.

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Growth of thin aluminium oxide films on stainless steel by MOCVD at ambient pressure and by using a hot-wall CVD-setup

Cited by 39 publications

References 10 publications

CVD of Thin Ruby Films on Si(100) and Stainless Steel for Surface Temperature Sensor Applications

CVD of Thin Ruby Films on Si(100) and Stainless Steel for Surface Temperature Sensor Applications

Orientation control of .ALPHA.-Al2O3 films prepared by laser chemical vapor deposition using a diode laser

Study of Cavitation Erosion Experiments on Thermally Oxidized Rutile Phase TiO<SUB>2</SUB> Films on Stainless Steel

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