1999
DOI: 10.1016/s0921-5107(99)00187-7
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Growth of V2O5 thin films by pulsed laser deposition and their applications in lithium microbatteries

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Cited by 122 publications
(43 citation statements)
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“…sputtering under a gas mixture of argon and oxygen [11], for spin-coated and heat-treated V 2 O 5 films above 300 C [5] and for sol-gel dip coating films pyrolyzed at 400 C on a fused silica substrate [7]. The c-axis preferred growth is also found for V 2 O 5 films prepared by pulsed-laser deposition [14], by 246 M. BENMOUSSA et al…”
Section: Structure and Morphology Of The Filmsmentioning
confidence: 94%
“…sputtering under a gas mixture of argon and oxygen [11], for spin-coated and heat-treated V 2 O 5 films above 300 C [5] and for sol-gel dip coating films pyrolyzed at 400 C on a fused silica substrate [7]. The c-axis preferred growth is also found for V 2 O 5 films prepared by pulsed-laser deposition [14], by 246 M. BENMOUSSA et al…”
Section: Structure and Morphology Of The Filmsmentioning
confidence: 94%
“…One of the principal properties of the films obtained by PLD is the high density compared with films grown by classical techniques. [29]. For a substrate maintained at 500 • C, the grain size of PLD films is~80 nm (Figure 8c).…”
Section: Vanadium Pentoxidementioning
confidence: 98%
“…It is built of [V2O5] layers separated by Na + ions. Nanostructured thin films of V2O5 deposited on Si(100) substrate were obtained by pulse laser deposition (PLD) [29]. For a substrate maintained at 500 °C, the grain size of PLD films is ~80 nm (Figure 8c).…”
Section: Vanadium Pentoxidementioning
confidence: 99%
“…1 In recent years V 2 O 5 has also been used with intercalating Li ions for high-capacity solid-state batteries. [2][3][4][5] The applied research and industrial focus on catalysis and batteries involving V 2 O 5 has led to a substantial amount of atomic-scale theory studies focusing on the V 2 O 5 bulk [5][6][7][8][9][10][11][12] and its surfaces. [12][13][14][15][16] The bulk of V 2 O 5 has a stacked structure.…”
Section: Introductionmentioning
confidence: 99%