Growth of wafer-scale MoS₂ monolayer by magnetron sputtering

Abstract

The two-dimensional layer of molybdenum disulfide (MoS2) exhibits promising prospects in the applications of optoelectronics and valleytronics. Herein, we report a successful new process for synthesizing wafer-scale MoS2 atomic layers on diverse substrates via magnetron sputtering. Spectroscopic and microscopic results reveal that these synthesized MoS2 layers are highly homogeneous and crystallized; moreover, uniform monolayers at wafer scale can be achieved. Raman and photoluminescence spectroscopy indicate comparable optical qualities of these as-grown MoS2 with other methods. The transistors composed of the MoS2 film exhibit p-type performance with an on/off current ratio of ∼10(3) and hole mobility of up to ∼12.2 cm(2) V(-1) s(-1). The strategy reported herein paves new ways towards the large scale growth of various two-dimensional semiconductors with the feasibility of controllable doping to realize desired p- or n-type devices.

Electronic properties of atomically thin MoS2 layers grown by physical vapour deposition: band structure and energy level alignment at layer/substrate interfaces

“…10,11 A detailed characterization of the electronic properties of the asgrown TMDC layers at variance of the deposition conditions is critical for the device optimization, as they control the charge transport in the layer and at its interface with conductive electrodes. In this context, angle resolved photoemission spectroscopy (ARPES) studies have already proven to be useful for elucidating the electronic band structures of both exfoliated 12 and large scale growth TMDC single crystal layers.…”

Scalable Fabrication of 2D Semiconducting Crystals for Future Electronics

“…In particular, the unique properties of 2D TMDCs will enable innovative applications in emerging electronics and provide ideal solutions to the challenging research fields nowadays, such as monolithic 3D integration. mechanical cleavage [14] mechanical cleavage, multilayer [48] annealed sapphire [25] patterned substrates [21] seeding promoter [27] seeding promoter, WS2 [27] ALD, WS2, TG [28] plasma, 1L [29] plasma, 2L [29] plasma, 3L [29] MoO2 precursor [30] all-gas precursors [23] all-gas precursor, WS2 [23] thermal decomposition [33] sputtering [34] Mo-S-Se alloy [39] MoS2/WS2 stacks [44] selective growth [46] Mobility (cm…”

“…Tao et al [34] recently developed a one-step magnetron sputtering technique to synthesize wafer-scale MoS2 atomic layers on various substrates. As illustrated in Figure 12b, the growth is based on the reaction between vaporized S and sputtered Mo.…”

Formation and investigation of thin MoS2 films for electronics

“…Another method widely used for obtaining TMDs is known mechanical exfoliation. PVD methods have been produced TMD films of materials such as MoS 2 [9], WS 2 [10], WSe 2 [11]. In this paper we will examine the production of MoS 2 thin films by the method of magnetron sputtering, which could be subsequently used as a raw material for the production of ML-MoS 2 for electronics.…”