2016
DOI: 10.1116/1.4943926
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Growth optimization for self-catalyzed GaAs-based nanowires on metal-induced crystallized amorphous substrate

Abstract: The growth of monocrystalline semiconductor nanowires on arbitrary substrates via the metal-induced crystallization (MIC) process extends the possible combinations of substrates and epitaxial active materials. However, it is still difficult to accomplish high-density vertical nanowire growth on the MIC polycrystalline Si(111) substrate. Here, the authors report on the growth of self-catalyzed GaAs nanowires by molecular beam epitaxy on MIC polycrystalline Si(111) substrates with different surface oxide conditi… Show more

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Cited by 6 publications
(5 citation statements)
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“…This is very important in realizing heterostructures and will help expand the range of emission wavelengths. This also enables the growth of semiconductor NWs on dissimilar materials including III-V and III-nitride NWs on crystalline Si [5-7, 14, 28], polycrystalline or amorphous Si [29,30], and graphene [31][32][33]. Second, heterostructures can be realized in two distinct forms, namely, radial (core-shell) and axial (vertical) heterostructures.…”
Section: Introductionmentioning
confidence: 99%
“…This is very important in realizing heterostructures and will help expand the range of emission wavelengths. This also enables the growth of semiconductor NWs on dissimilar materials including III-V and III-nitride NWs on crystalline Si [5-7, 14, 28], polycrystalline or amorphous Si [29,30], and graphene [31][32][33]. Second, heterostructures can be realized in two distinct forms, namely, radial (core-shell) and axial (vertical) heterostructures.…”
Section: Introductionmentioning
confidence: 99%
“…The self-catalyzed GaAs NW growth method was used to grow a Be-doped p-type GaAs NW core at 625 °C. Ga predeposition and a Be-doped GaAsSb stem (∼90 nm) growth step were adopted for 45 s and 1 min, respectively, to enhance the vertical yield of the NWs in the array . Ga, As 2 , and Sb 2 fluxes were 0.7 ML/s, 3 × 10 –6 , and 1 × 10 –7 Torr, respectively.…”
Section: Methodsmentioning
confidence: 99%
“…Ga predeposition and a Be-doped GaAsSb stem (∼90 nm) growth step were adopted for 45 s and 1 min, respectively, to enhance the vertical yield of the NWs in the array. 35 Ga, As 2 , and Sb 2 fluxes were 0.7 ML/s, 3 × 10 −6 , and 1 × 10 −7 Torr, respectively. Ga and Al fluxes are stated as equivalent to thin-film growth rates at 585 °C on a GaAs(001) substrate.…”
Section: Introductionmentioning
confidence: 94%
“…[27] Besides growth on semiconductor substrates, these NWs can even be grown on graphitic and metal-induced crystalline Si substrates. InAsSb NWs on a graphite substrate show a morphology of aspect ratio over 100 with the assistance of In droplets during nucleation [28], and the growth of GaAsSb NWs on a metal-induced crystalline Si substrate shows a higher density of vertical NWs compared to the GaAs ones [29].…”
Section: The Growth Of Iii-as-sb Nwsmentioning
confidence: 99%