2011
DOI: 10.4028/www.scientific.net/kem.495.108
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Growth, Structural and Mechanical Characterization and Reliability of Chemical Vapor Deposited Co and Co<sub>3</sub>O<sub>4</sub> Thin Films as Candidate Materials for Sensing Applications

Abstract: The adhesion and mechanical stability of thin film coatings on substrates is increasingly becoming a key issue in device reliability as magnetic and storage technology driven products demand smaller, thinner and more complex functional coatings. In the present study, chemical vapor deposited Co and Co3O4thin films on SiO2and Si substrates are produced, respectively. Chemical vapor deposition is the most widely used deposition technique which produces thin films well adherent to the substrate. Co and Co3O4thin … Show more

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Cited by 3 publications
(9 citation statements)
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“…The nanomechanical properties of the thin films, i.e. H and E, are presented elsewhere [7] and are in good agreement with similar measurements of the literature [8][9]. Cobalt thin film exhibit local changes (discontinuities), i.e.…”
Section: Load-displacement Curvessupporting
confidence: 64%
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“…The nanomechanical properties of the thin films, i.e. H and E, are presented elsewhere [7] and are in good agreement with similar measurements of the literature [8][9]. Cobalt thin film exhibit local changes (discontinuities), i.e.…”
Section: Load-displacement Curvessupporting
confidence: 64%
“…Cobalt thin film exhibit local changes (discontinuities), i.e. changes in the slope, referred as pop-ins and elbows in the loading and in the unloading curve, respectively [7]. During the pop-in, the indenter tip penetrates in the sample without an increase in the applied load.…”
Section: Load-displacement Curvesmentioning
confidence: 99%
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