Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates

Kaiser, Ute; Adamik, M.; Sáfrán, György; Barna, P.B.; Laux, Sven; Richter, Wolfgang

doi:10.1016/0040-6090(95)08237-9

Cited by 25 publications

(12 citation statements)

References 8 publications

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“…13(a)-13(d). Usually films always grow into columnar structures for most fluoride materials [22,23]. However, such structures were not observed for AlF 3 films, which exhibited a homogeneous structure.…”

Section: Cross-sectional Morphologymentioning

confidence: 98%

Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region

Sun

Zhang

et al. 2012

Appl. Opt.

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Aluminum fluoride (AlF(3)) is a low-refractive-index material widely used in coatings for deep-ultraviolet (DUV) optical systems, especially 193 nm laser systems. Low optical loss and stability are essential for film application. In this study, AlF(3)> thin films were prepared by thermal evaporation with a resistive heating boat. The effects of substrate temperatures and deposition rates on the optical properties in vacuum and in air, composition, and microstructures were discussed respectively. In vacuum the deposition parameters directly influenced the microstructures that determined the refractive index. When the films were exposed to air, aluminum oxide (Al(2)O(3)) formed in the films with water adsorption. Thus the refractive index increased and a nonmonotonic changing trend of the refractive index with substrate temperature was observed. The Al(2)O(3) was also found to be conductive to reducing absorption loss. AlF(3) films prepared at a high substrate temperature and deposition rate could yield stable structures with large optical loss.

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Section: Cross-sectional Morphologymentioning

confidence: 98%

Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region

Sun

Zhang

et al. 2012

Appl. Opt.

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“…Jacob and co-workers [6,7,10] investigated the microstructures of MgF 2 films but did not discuss the relationships between the film's microstructures and its optical properties, especially in the DUV wavelength region. Liu and co-workers [3,4] prepared MgF 2 films using resistive heating boat deposition under different substrate temperatures but neither studied the difference between the optical properties of the films in air and those in vacuum nor evaluated the effects of film composition on its optical properties.…”

Section: Introductionmentioning

confidence: 99%

Effects of substrate temperatures on the characterization of magnesium fluoride thin films in deep-ultraviolet region

et al. 2014

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As a low refractive index material widely used in coatings for deep-ultraviolet optical systems, magnesium fluoride (MgF2) films were prepared by electron beam evaporation at different substrate temperatures. The effects of the substrate temperatures on the optical properties in vacuum and in air, microstructures, and composition were investigated, as were the microstructures, their composition, and the relation between them. In vacuum, the substrate temperature directly affected the microstructures which dominated the packing density and inhomogeneity along the film thickness. When the films were exposed to air, the refractive index increased and a nonmonotonic change trend of the refractive index with substrate temperature was observed due to adsorbed water and magnesium oxide (MgO) formed in the film. While a moderate amount of MgO reduced absorption loss by decreasing vacancy defects, excessive MgO increased the absorption loss because of the high extinction coefficient of the oxide.

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“…[17] MgF 2 films are also interesting due to their applications to produce multilayers with conducting materials (Ag) [18] suited for protective coatings, electromagnetic shielding, [19] and solar cells. [20] To date, various methods have been used for fabricating MgF 2 thin films, including plasma ion assisted deposition, [21] molecular beam epitaxy (MBE), [22] physical vapor deposition (PVD), [23] ion beam sputtering (IBS), [24] sol-gel, [25] and atomic layer deposition (ALD). [26] ALD presents the benefits of high control of the layer thickness and also high uniformity, excellent step coverage, and high reproducibility.…”

Section: Introductionmentioning

confidence: 99%

MOCVD Fabrication of Magnesium Fluoride Films: Effects of Deposition Parameters on Structure and Morphology

Fragalà¹,

Toro²,

Privitera³

et al. 2011

Chemical Vapor Deposition

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Magnesium fluoride (MgF 2 ) films are fabricated via low pressure metal-organic (MO)CVD on glass or quartz substrates from the novel single-source precursor Mg(hfa) 2 Á 2H 2 O Á 2diglyme. The nature and quality of films are scrutinized depending on relevant operational parameters, namely the deposition temperature, the precursor vaporization rate, and finally the flow of the oxygen reacting gas. Grazing incidence X-ray diffraction (GIXRD) data point to the formation of crystalline MgF 2 films. Scanning electron microscope (SEM) images indicate very homogeneous surfaces with grain dimensions dependent upon operational conditions, while energy dispersive X-ray (EDX) analyses point to the absence of any C or O contaminants. Smooth and homogeneous surfaces can be obtained upon deposition under high oxygen flow. The MgF 2 film deposited on glass at 400 8C under optimized conditions shows a $80% transmittance in the range 300 À 800 nm. The high crystalline and optical quality of the MgF 2 films, deposited using mild deposition temperatures (< 450 8C) still confirms MOCVD as a versatile and competitive deposition technique.

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Growth structure investigation of MgF2 and NdF3 films grown by molecular beam deposition on CaF2(111) substrates

Cited by 25 publications

References 8 publications

Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region

Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region

Effects of substrate temperatures on the characterization of magnesium fluoride thin films in deep-ultraviolet region

MOCVD Fabrication of Magnesium Fluoride Films: Effects of Deposition Parameters on Structure and Morphology

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