2021
DOI: 10.3390/nano11082047
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Growth Temperature Influence on Atomic-Layer-Deposited In2O3 Thin Films and Their Application in Inorganic Perovskite Solar Cells

Abstract: Recently, indium oxide (In2O3) thin films have emerged as a promising electron transport layer (ETL) for perovskite solar cells; however, solution-processed In2O3 ETL suffered from poor morphology, pinholes, and required annealing at high temperatures. This research aims to carry out and prepare pinhole-free, transparent, and highly conductive In2O3 thin films via atomic layer deposition (ALD) seizing efficiently as an ETL. In order to explore the growth-temperature-dependent properties of In2O3 thin film, it … Show more

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Cited by 17 publications
(8 citation statements)
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“…A PCE of 10.97% (a J SC of 13.64 mA cm −2 , a V OC of 1.13 V and a FF of 0.710) was achieved for the device under investigation derived from the In 2 O 3 ETL deposited at 250 °C. 59 To replace the commonly used ETL ( i.e. [6,6]-phenyl C61 butyric acid methyl ester, PCBM and the derivatives of C60) in the inverted p–i–n CsPbI 2 Br PSC structure, a low-temperature solution-processed metal sulphide ETL was developed by a simple ligand exchange process in the anhydrous ether solution containing 1, 2-ethanedithiol (EDT).…”
Section: Strategies For Boosting the Performance And Stability Of Csp...mentioning
confidence: 99%
“…A PCE of 10.97% (a J SC of 13.64 mA cm −2 , a V OC of 1.13 V and a FF of 0.710) was achieved for the device under investigation derived from the In 2 O 3 ETL deposited at 250 °C. 59 To replace the commonly used ETL ( i.e. [6,6]-phenyl C61 butyric acid methyl ester, PCBM and the derivatives of C60) in the inverted p–i–n CsPbI 2 Br PSC structure, a low-temperature solution-processed metal sulphide ETL was developed by a simple ligand exchange process in the anhydrous ether solution containing 1, 2-ethanedithiol (EDT).…”
Section: Strategies For Boosting the Performance And Stability Of Csp...mentioning
confidence: 99%
“…Bulk In 2 O 3 exhibits high carrier mobility (140-170 cm 2 V −1 s −1 ), low resistivity, and excellent chemical and thermal stabilities. 169 In 2 O 3 has been used as a good alternative electron selective layer in PSCs, achieving a PCE of 13.01%. 170 The In 2 O 3 film surface was passivated by PCBM to produce pinhole and crack-free films, achieving an enhanced PCE of 14.83% with reduced hysteresis.…”
Section: Other Metal Oxidesmentioning
confidence: 99%
“…[ 16 ] To improve the quality of the SnO 2 /perovskite interface, researchers have explored many interfacial materials, such as inorganic salts (KCl, [ 17 ] KOH, [ 18 ] NH 4 Cl, [ 19,20 ] and NH 4 F [ 21 ] ), organic small molecules (ethylenediaminetetraacetic acid [EDTA], [ 22 ] triphenylphosphine oxide [TPPO] [ 23 ] ), and polymers (polyethylene glycol [PEG], [ 24 ] poly(ethylene glycol) diacrylate ([PEGDA] [ 25 ] ). Particularly, previous literature report that In 2 O 3 can be utilized as ETL, [ 26–30 ] interlayer between transparent conducting oxide and ETL [ 26,31,32 ] or interlayer between ETL and perovskite layer [ 33–35 ] due to the high electron mobility (~25 cm 2 V −1 s −1 ), [ 36 ] high light transmission properties, [ 37 ] and low‐temperature processing (~200°C). [ 31 ] These interfacial materials facilitate the electron transfer at the SnO 2 /perovskite interface by aligning the conduction band maximum and passivating the interfacial defects.…”
Section: Introductionmentioning
confidence: 99%
“…[PEG], [24] poly(ethylene glycol) diacrylate ([PEGDA] [25] ). Particularly, previous literature report that In 2 O 3 can be utilized as ETL, [26][27][28][29][30] interlayer between transparent conducting oxide and ETL [26,31,32] or interlayer between ETL and perovskite layer [33][34][35] due to the high electron mobility (~25 cm 2 V −1 s −1 ), [36] high light transmission properties, [37] and low-temperature processing (~200°C). [31] These interfacial materials facilitate the electron transfer at the SnO 2 /perovskite interface by aligning the conduction band maximum and passivating the interfacial defects.…”
Section: Introductionmentioning
confidence: 99%