2020
DOI: 10.1039/d0ra04496b
|View full text |Cite
|
Sign up to set email alerts
|

Guiding neural extensions of PC12 cells on carbon nanotube tracks dielectrophoretically formed in poly(ethylene glycol) dimethacrylate

Abstract:

A schematic illustration of the strategy used to create a microenvironment consisting of micropatterns and CNT tracks. The new microenvironment allowed roughly positioning of PC12 cells and guidance of neural extensions.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
6
1

Year Published

2020
2020
2024
2024

Publication Types

Select...
6
3

Relationship

3
6

Authors

Journals

citations
Cited by 12 publications
(7 citation statements)
references
References 30 publications
0
6
1
Order By: Relevance
“…After optimization, ridge structures with minimal distances of ∼10 μm and structure heights of 5–6 μm could be achieved, which is greater than the 3 μm reported as necessary to prevent neurites from crossing over them ( Weigel et al, 2012 ; Supplementary Figure 1F ). Patterned sapphire disks were coated with either poly-L-lysine or collagen, which are typical coatings to facilitate the attachment and growth of neuronal cells ( Watanabe, 2016 ; Seven et al, 2020 ).…”
Section: Resultsmentioning
confidence: 99%
“…After optimization, ridge structures with minimal distances of ∼10 μm and structure heights of 5–6 μm could be achieved, which is greater than the 3 μm reported as necessary to prevent neurites from crossing over them ( Weigel et al, 2012 ; Supplementary Figure 1F ). Patterned sapphire disks were coated with either poly-L-lysine or collagen, which are typical coatings to facilitate the attachment and growth of neuronal cells ( Watanabe, 2016 ; Seven et al, 2020 ).…”
Section: Resultsmentioning
confidence: 99%
“…Titanium (Ti) and gold (Au) films were sputtered on the glass slide with patterned photoresist. Lastly, the remaining photoresist was removed using acetone to define the Au patterns of the microchip [10], [11], [12].…”
Section: B Microchip Productionmentioning
confidence: 99%
“…Ti and Au films were sputtered on the glass slide with patterned photoresist. Lastly, the remaining photoresist was removed using acetone to define the Au patterns of the microchip [11], [12], [13].…”
Section: B Microchip Productionmentioning
confidence: 99%