Hall effect in Al–W thin films

Ivkov, Jovica; Radić, Nikola; Tonejc, Antun

doi:10.1016/j.ssc.2003.11.002

Cited by 2 publications

(3 citation statements)

References 26 publications

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“…Interestingly, r RT of Al 75 Mo 25 and Al 70 Mo 30 increases 3 times upon crystallization. In a similar Al x W 100Àx system, a maximum in r RT of 480 mU m is observed for as deposited amorphous alloys Al 80 W 20 [12], which upon crystallization increases for some 50 % [26]. For comparison, the resistivities of TETL amorphous metals are typically around 200 mU cm [10].…”

Section: For Comparison Inmentioning

confidence: 97%

“…Hybridization cause a minimum in the electron density of states and, if the Fermi level falls within that minimum, the effective number of conducting electrons decreases and hence resistivity increases. From the results for amorphous AleMo and AleW [12] alloys, the hybridisation is strongest for Al:RM ratios equal to 3:1 and 4:1, respectively. The resistivity of crystallized alloys may be further increased by the strong Fermi level-Brillouin zone interaction which flattens electronic bands.…”

Section: For Comparison Inmentioning

confidence: 99%

“…Though the transport properties of the amorphous Al-RM are much less investigated, the measurement of the electrical resistivity [11] and the Hall effect [12] of AleW amorphous thin films allows interpretation with the same terms as those of TETL alloys, i.e. by the quantum interference at defects (QID) and spd hybridization.…”

Section: Introductionmentioning

confidence: 99%

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Thermal stability of Al–Mo thin film alloys

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Section: For Comparison Inmentioning

confidence: 97%

Section: For Comparison Inmentioning

confidence: 99%

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Thermal stability of Al–Mo thin film alloys

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et al. 2015

Journal of Alloys and Compounds

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Evaluation of the hardness and Young's modulus of electrodeposited Al–W alloy films by nano-indentation

Higashino

Miyake

Matamura

et al. 2017

Surface and Coatings Technology

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14Al-W alloy films with various W contents up to ~12 at% were prepared by 15 electrodeposition using 1-ethyl-3-methylimidazolium chloride (EMIC)-AlCl3 ionic 16 liquids with different concentrations of W precursor, W6Cl12. The hardness (H) and 17 Young's modulus (E) of the films were examined by nano-indentation. The films were 18 composed of a single-phase fcc Al super-saturated solid solution, an amorphous phase, or 19 both, depending on the W content and the deposition conditions. The H value increased 20 with increasing W content up to 9.8 at% and then decreased slightly with further increases 21 in the W content up to 12.4 at%. A similar trend was observed in the E value with 22 increasing W content, but the decrease in E value at 12.4 at% W was more significant than 23 that in H value. The changes in the H and E values are discussed from the viewpoints of 24 the grain size and the constituent phases. The 9.8-12.4 at% W films, which had relatively 25 high H values and H/E ratios, are expected to have a higher resistance to mechanical 26 damage than Al films.27 28 Keywords 29 Electroplating, Ionic liquid, Nano-indentation, Amorphous alloy, Aluminum, Tungsten 30 31 2 1 1. Introduction 2 Al metal shows high oxidation and corrosion resistance because of the thin passive film 3 on its surface. Thus Al metal films have attracted much research attention as corrosion-4 protective coatings on reactive materials such as a Mg alloy [1,2]. However, if exposed 5 to an environment containing halide anions such as Cl − , the passive film on Al metal is 6 destroyed locally, followed by pitting corrosion [3]. The resistance of Al metal to pitting 7 corrosion is enhanced by alloying with other transition metals [3]. Among Al alloys, Al-8 W alloys are known to exhibit significant resistance to pitting corrosion [3,4]. Therefore, 9 the formation of Al-W alloy films was intensively studied. 10 The formation of Al-W alloy films by sputtering [4-15], ion implantation [16], laser 11 surface alloying [17], and electrodeposition [18-22] was reported. Of these methods, 12 electrodeposition has particular advantages in that a thick film can be formed over a large 13 area relatively quickly by means of simple equipment. The electrodeposition of Al-W 14 alloys with high W contents was achieved using a 1-ethyl-3-methylimidazolium chloride 15 (EMIC)-AlCl3 ionic liquid containing potassium tungsten(III) chloride, K3W2Cl9 [18-16 20]. However, alloys with more than 5 at% W obtained from this bath showed a powdery 17 morphology. The morphology was improved by changing the W precursor from K3W2Cl9 18 to tungsten(II) chloride, W6Cl12 [22]. We reported that dense Al-W alloy films with up to 19 ~12 at% W can be electrodeposited from an EMIC-AlCl3 ionic liquid containing W6Cl12 20[22]. The Al-W alloy films obtained from this bath were composed of a super-saturated 21 fcc Al solid solution with W contents lower than ~9 at%, and with an amorphous phase 22

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Hall effect in Al–W thin films

Cited by 2 publications

References 26 publications

Thermal stability of Al–Mo thin film alloys

Thermal stability of Al–Mo thin film alloys

Evaluation of the hardness and Young's modulus of electrodeposited Al–W alloy films by nano-indentation

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