Hard X-ray Photoelectron Spectroscopy (HAXPES) characterisation of electrochemical passivation oxide layers on Al–Cr–Fe complex metallic alloys (CMAs)

Beni, Alessandra; Ott, Noémie; Pawełkiewicz, M.; Wardé, M.; Young, K. M.; Bauer, Birgitta; Rajput, Parasmani; Detlefs, Blanka; Zegenhagen, J.; McGrath, R.; Barthés-Labrousse, M.-G.; Jeurgens, Lars P. H.; Schmutz, Patrik

doi:10.1016/j.elecom.2014.05.024

Cited by 19 publications

(15 citation statements)

References 15 publications

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“…The experimental evidence of passive Fe dissolution (UV-Vis results) for 27.2at% Cr phase as well as for 15.0at% Cr phase in the early immersion stage in this acidic electrolyte is also in agreement with the HAXPES finding that the passive oxide layer on high Cr content Al-Cr-Fe phases consists only of Al and Cr oxyhydroxide [6]. On the other side, EDX characterisation performed on unstable defective oxide product layers formed on lower Cr content alloys (12.5at% Cr and 15.0at% Cr when the initial passivating oxide is removed at longer immersion time) show a thick oxide layer containing Fe corrosion products [8].…”

Section: Uv-vis Absorption Spectroscopy Characterisationsupporting

confidence: 87%

“…On the contrary, pure Cr and 27.2at% Cr phase can form in this aggressive environment a thin stable oxyhydroxide layer which effectively protects the sample from degradation. This correlates with the HAXPES finding [6], indicating that a significant amount of chromium (>18 at. %) is essential to ensure passive film stability of Al-Cr-Fe CMA phases.…”

Section: Icpms Characterisation and Ph Evolutionsupporting

confidence: 75%

“…Therefore, it can be assumed that no precipitation of pure a-Cr(OH) 3 compounds occurs at pH values below 4. However, the visible drop in concentrations for all the phases except for pure Cr points out a possible precipitation process, probably of the hydroxide Cr 4 (OH) 6 6+ in a mixed form with Fe and with some integration of Al cations (as it can be suggested by the drop in concentrations in Fig. 1).…”

Section: Hydrolysis and Chloride Speciation Of Chromiummentioning

confidence: 88%

“…The Al-based CMA are stable in a broad pH range (pH 0 H 2 SO 4 to pH 14 NaOH) [5], [6], thus, being promising as functional coatings for Al alloys and low alloyed steels.…”

Section: Introductionmentioning

confidence: 99%

“…In acidic chloride containing aggressive environments, the passive film stability can be significantly improved by anodic polarisation in the low passive region, due to the changes induced to the passive film structure ( [7]). A non-destructive compositional analysis of the oxyhydroxide layer after electrochemical treatment in these environments, using Hard X-Ray Photoelectron charaterisation (HAXPES) [6], showed moreover, the existence of a Cr content threshold at 18%at Cr, essential to ensure the transition from the formation of a defective corrosion product layer to a protective stable passive film (corrosion vs. passivity).…”

Section: Introductionmentioning

confidence: 99%

See 4 more Smart Citations

Passivation/precipitation mechanisms of Al-Cr-Fe Complex Metallic Alloys in acidic chloride containing electrolyte

Beni

Ott

Caporali

et al. 2015

Electrochimica Acta

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Section: Uv-vis Absorption Spectroscopy Characterisationsupporting

confidence: 87%

Section: Icpms Characterisation and Ph Evolutionsupporting

confidence: 75%

Section: Hydrolysis and Chloride Speciation Of Chromiummentioning

confidence: 88%

“…The Al-based CMA are stable in a broad pH range (pH 0 H 2 SO 4 to pH 14 NaOH) [5], [6], thus, being promising as functional coatings for Al alloys and low alloyed steels.…”

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Passivation/precipitation mechanisms of Al-Cr-Fe Complex Metallic Alloys in acidic chloride containing electrolyte

Beni

Ott

Caporali

et al. 2015

Electrochimica Acta

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Trap‐Assisted Memristive Switching in HfO₂‐Based Devices Studied by In Situ Soft and Hard X‐Ray Photoelectron Spectroscopy

Zahari

Marquardt

Kalläne

et al. 2023

Adv Elect Materials

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Memristive devices are under intense development as non‐volatile memory elements for extending the computing capabilities of traditional silicon technology by enabling novel computing primitives. In this respect, interface‐based memristive devices are promising candidates to emulate synaptic functionalities in neuromorphic circuits aiming to replicate the information processing of nervous systems. A device composed of Nb/NbOx/Al2O3/HfO2/Au that shows promising features like analog switching, no electro‐forming, and high current‐voltage non‐linearity is reported. Synchrotron‐based X‐ray photoelectron spectroscopy and depth‐dependent hard X‐ray photoelectron spectroscopy are used to probe in situ different resistance states and thus the origin of memristive switching. Spectroscopic evidence for memristive switching based on the charge state of electron traps within HfO2 is found. Electron energy loss spectroscopy and transmission electron microscopy support the analysis. A device model is proposed that considers a two‐terminal metal–insulator–semiconductor structure in which traps within the insulator (HfO2/Al2O3) modulate the space charge region within the semiconductor (NbOx) and, thereby, the overall resistance. The experimental findings are in line with impedance spectroscopy data reported in the companion paper (Marquardt et al). Both works complement one another to derive a detailed device model, which helps to engineer device performance and integrate devices into silicon technology.

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Concepts for chemical state analysis at constant probing depth by lab‐based XPS/HAXPES combining soft and hard X‐ray sources

Siol

Mann²,

Newman³

et al. 2020

Surface & Interface Analysis

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The greater information depth provided in Hard X-ray Photoelectron Spectroscopy (HAXPES) enables non-destructive analyses of the chemistry and electronic structure of buried interfaces. Moreover, for industrially relevant elements like Al, Si and Ti, the combined access to the Al 1s, Si 1s or Ti 1s photoelectron line and its associated Al KLL, Si KLL or Ti KLL Auger transition, as required for local chemical state analysis on the basis of the Auger parameter, is only possible with hard X-rays. Until now, such photoemission studies were only possible at synchrotron facilities. Recently however, the first commercial XPS/HAXPES systems, equipped with both soft and hard X-ray sources, have entered the market, providing unique opportunities for monitoring the local chemical state of all constituent ions in functional oxides at different probing depths, in a routine laboratory environment. Bulksensitive shallow core-levels can be excited using either the hard or soft X-ray source, whereas more surface-sensitive deep core-level photoelectron lines and associated Auger transitions can be measured using the hard X-ray source. As demonstrated for thin Al2O3, SiO2 and TiO2 films, the local chemical state of the constituting ions in the oxide may even be probed at near constant probing depth by careful selection of sets of photoelectron and Auger lines, as excited with the combined soft and hard X-ray sources. We highlight the potential of lab-based HAXPES for the research on functional oxides and also discuss relevant technical details regarding the calibration of the kinetic binding energy scale. Supporting information:Advanced chemical state studies of oxide films by lab-based HAXPES combining soft and hard X-ray sources

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Hard X-ray Photoelectron Spectroscopy (HAXPES) characterisation of electrochemical passivation oxide layers on Al–Cr–Fe complex metallic alloys (CMAs)

Cited by 19 publications

References 15 publications

Passivation/precipitation mechanisms of Al-Cr-Fe Complex Metallic Alloys in acidic chloride containing electrolyte

Passivation/precipitation mechanisms of Al-Cr-Fe Complex Metallic Alloys in acidic chloride containing electrolyte

Trap‐Assisted Memristive Switching in HfO₂‐Based Devices Studied by In Situ Soft and Hard X‐Ray Photoelectron Spectroscopy

Concepts for chemical state analysis at constant probing depth by lab‐based XPS/HAXPES combining soft and hard X‐ray sources

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Hard X-ray Photoelectron Spectroscopy (HAXPES) characterisation of electrochemical passivation oxide layers on Al–Cr–Fe complex metallic alloys (CMAs)

Cited by 19 publications

References 15 publications

Passivation/precipitation mechanisms of Al-Cr-Fe Complex Metallic Alloys in acidic chloride containing electrolyte

Passivation/precipitation mechanisms of Al-Cr-Fe Complex Metallic Alloys in acidic chloride containing electrolyte

Trap‐Assisted Memristive Switching in HfO2‐Based Devices Studied by In Situ Soft and Hard X‐Ray Photoelectron Spectroscopy

Concepts for chemical state analysis at constant probing depth by lab‐based XPS/HAXPES combining soft and hard X‐ray sources

Contact Info

Product

Resources

About

Trap‐Assisted Memristive Switching in HfO₂‐Based Devices Studied by In Situ Soft and Hard X‐Ray Photoelectron Spectroscopy