Hardness and modulus of elasticity of atomic layer deposited Al2O3-ZrO2 nanolaminates and mixtures

Jõgiaas, Taivo; Zabels, R.; Tarre, Aivar; Tamm, Aile

doi:10.1016/j.matchemphys.2019.122270

Cited by 16 publications

(6 citation statements)

References 46 publications

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“…(Hereafter, the values are given at ≈10 nm of displacement, if not stated otherwise.) These values are similar to previously published results [ 35 ].…”

Section: Resultssupporting

confidence: 93%

“…The density value for pure hafnia corresponds to the density of monoclinic HfO 2 , the phase confirmed by the diffraction pattern. The alumina density corresponds approximately to a previously published value [35]. The deviations for thickness values were 1 nm or less and 0.2 g/cm 3 or less for density.…”

Section: Film Thickness Density and Roughnesssupporting

confidence: 83%

“…Despite the fact that for years ALD has been used to deposit HfO 2 and its doped versions, including Al as the dopant, there are fewer reports on mechanical properties of such films. In a previous work about Al 2 O 3 -doped ZrO 2 , it was shown that Al 2 O 3 can induce and stabilize a metastable tetragonal phase of zirconia [ 35 ]. The same has been claimed about Al 2 O 3 -doped HfO 2 [ 8 ].…”

Section: Introductionmentioning

confidence: 99%

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Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide

et al. 2023

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Coatings with tunable refractive index and high mechanical resilience are useful in optical systems. In this work, thin films of HfO2 doped with Al2O3 were deposited on silicon at 300 °C by using plasma-enhanced atomic layer deposition (PE-ALD). The mainly amorphous 60–80 nm thick films consisted Al in the range of 2 to 26 at. %. The refractive indexes varied from 1.69 to 2.08 at the wavelength of 632 nm, and they consistently depended on the composition. The differences were higher in the UV spectral region. At the same time, the hardness of the films was from 12–15 GPa; the modulus was in the range of 160–180 GPa; and the mechanical properties did not have a good correlation with the deposited compositions. The deposition conditions, element contents, and refractive indexes at respective wavelengths were correlated. The results indicated that it is possible to tune optical properties and retain mechanical properties of atomic layer-deposited thin films of HfO2 with Al2O3 as doping oxide. Such films could be used as mechanically resilient and optically tunable coatings in, for instance, micro- or nano-electromechanical systems or transparent displays.

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“…(Hereafter, the values are given at ≈10 nm of displacement, if not stated otherwise.) These values are similar to previously published results [ 35 ].…”

Section: Resultssupporting

confidence: 93%

Section: Film Thickness Density and Roughnesssupporting

confidence: 83%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide

et al. 2023

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“…In our case, with such dimensions of crystallites in the range of several nanometres, the Hall-Petch effect might be one of the factors increasing the hardness of AZO. Furthermore, the hardness of Al 2 O 3 thin films can reach 15–20 GPa [ 52 , 53 ]. Therefore, the presence of Al 2 O 3 phase in our AZO coatings may influence and increase their overall hardness.…”

Section: Resultsmentioning

confidence: 99%

A Comprehensive Investigation of the Mechanical and Tribological Properties of AZO Transparent Conducting Oxide Thin Films Deposited by Medium Frequency Magnetron Sputtering

Mazur,

Kiliszkiewicz,

Posadowski

et al. 2023

Materials

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This paper presents a detailed analysis of aluminium-doped zinc oxide (AZO) thin films and considers them a promising alternative to indium tin oxide in transparent electrodes. The study focusses on critical properties of AZO, including optical, electrical, and mechanical properties, with potential applications in displays, photovoltaic cells, and protective coatings. The deposited AZO thin films are characterised by excellent optical and electrical parameters, with transparency in the visible light range exceeding 80% and resistivity of 10−3 Ω·cm, which gives a high value of figure of merit of 63. Structural analysis confirms the nanocrystalline nature of as-deposited AZO thin films, featuring hexagonal ZnO, orthorhombic Al2O3, and cubic Al2ZnO4 phases. The study includes nanoindentation measurements, which reveal exceptional hardness (11.4 GPa) and reduced elastic modulus (98 GPa), exceeding typical values reported in the literature, highlighting their protective potential. Abrasion tests have shown extraordinary scratch resistance due to the lack of impact on topography and surface roughness up to 10,000 cycles. This comprehensive study demonstrated that as-deposited AZO thin films are multifunctional materials with exceptional optical, electrical, and mechanical properties. The findings open up possibilities for a variety of applications, especially in protective coatings, where the combination of hardness, scratch resistance, and transparency is both rare and valuable.

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“…The mechanical hardness of amorphous atomic layer deposited Al 2 O 3 thin films lays between 7 and 12 GPa. It has been reported to be 10.5 [23] and 12 [24] GPa on Si substrates, 11 GPa on TiN/Si [25], 9.5 GPa on soda-lime glass [26], and 7.2 [27] and 11.8 [28] GPa on steel substrates. The elastic modulus of these Al 2 O 3 films has varied from 68 (on glass) to 260 (on steel) GPa, while samples with Si substrate possessed intermediate values (145, 150, 220 GPa) [23][24][25][26]28].…”

Section: Introductionmentioning

confidence: 99%

Influence to Hardness of Alternating Sequence of Atomic Layer Deposited Harder Alumina and Softer Tantala Nanolaminates

et al. 2022

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Atomic layer deposited amorphous 70 nm thick Al2O3-Ta2O5 double- and triple-layered films were investigated with the nanoindentation method. The sequence of the oxides from surface to substrate along with the layer thickness had an influence on the hardness causing rises and declines in hardness along the depth yet did not affect the elastic modulus. Hardness varied from 8 to 11 GPa for the laminates having higher dependence on the structure near the surface than at higher depths. Triple-layered Al2O3/Ta2O5/Al2O3 laminate possessed the most even rise of hardness along the depth and possessed the highest hardness out of the laminates (11 GPa at 40 nm). Elastic modulus had steady values along the depth of the films between 145 and 155 GPa.

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Hardness and modulus of elasticity of atomic layer deposited Al2O3-ZrO2 nanolaminates and mixtures

Cited by 16 publications

References 46 publications

Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide

Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide

A Comprehensive Investigation of the Mechanical and Tribological Properties of AZO Transparent Conducting Oxide Thin Films Deposited by Medium Frequency Magnetron Sputtering

Influence to Hardness of Alternating Sequence of Atomic Layer Deposited Harder Alumina and Softer Tantala Nanolaminates

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