He-doped pseudospark as a home-lab XUV source beyond the beamtime bottleneck

Abstract

A table-top XUV-source based on pseudospark plasma-emission is operated with pure gases (Ar, O 2 and N 2 ) and mixtures (Ar/He, O 2 /He and N 2 /He) at different pressures and input voltages, and the dependence of these parameters on the source repetition rate, XUV-photon flux, XUVpower and emission spectra are discussed. Operating the source with Ar, it is shown that the repetition rate is increased if the pressure or input voltage from the power supply are increased. The intensity on the spectra and XUV photon flux (for Ar and Ar/He) are observed to decrease with increment of pure gas pressure and to increase with the addition of He to the pure gases. Repetition rates of up to 25 Hz and 10 13 photons/(2psr pulse) for λ between 7 and 16 nm and XUV-power of up to 10 mW/(2psr) have been observed. Stability measurements and determination of optimal sample position with respect to the highest number of photons are also presented. Fluctuations on the plasma emission up to 10% are observed.

Tabletop extreme ultraviolet time‐of‐flight spectrometry for trace analysis of high ionization energy samples

“…The measured spectrum highlights from which “donor” the detected photoelectron originated, as based on the ionization energy. The XUV plasma source was characterized to emit discrete lines at photon energies as high as 100 eV (Figure C). The electron binding energies, given by a specific state ( E b ), are obtained from the energy difference between the input photon energy and the output ( measured ) electron kinetic energy ( E k,meas ), as follows: where ϕ = U o + ε XUV is the “ work function ” given by the sum of the energy provided during ion optics extraction ( U o ), and the “ experimental error term ” ( ε XUV ) including the inhomogeneous electron acceleration as the ionization occurs within the XUV‐pulse duration.…”

“…It is based on a system of hollow electrodes, filled with a working gas and directly attached to a storage capacitor bank (C = 960 nF), as shown in Figure . Details on the spectral characterization of the source are given in Arbelo and Barbato, where the operation with various gases is discussed. In this work, a breakdown voltage of 2.3 kV, an Ar pressure of 0.08 mbar and an XUV‐pulse duration of about 260 ns were used.…”

“…The aim of this work was to implement a compact XUV photoionization TOF spectrometry setup for application on hard‐to‐ionize covalent species at trace level. The analytical setup used was based on a pseudospark XUV source coupled to an in‐house developed (nested) TOF/photoelectron spectrometer, embedding an induction detector for photoelectron Fourier transform (FT) spectrometry.…”

Non-contact XUV metrology of Ru/B4C multilayer optics by means of Hartmann wavefront analysis

“…Applications benefiting from the extreme ultraviolet (XUV) spectral range, such as imaging at nano-scale [1,2,3], next generation lithography [4,5], or spectroscopy [6,7,8], all need normal incidence optics based on multilayer coatings [9] which demand highquality finishing tolerances.…”

Induction spectrometry using an ultrafast hollow-cored toroidal-coil (HTC) detector

“…The aim of this work was to develop a hollow-cored toroidal coil detector (HTC) with high-pass response for ultrafast photoelectron spectroscopy, addressing the abovementioned issues. In order to test the capabilities of the HTC, electron pulses generated on a pseudospark XUV-source 15 were characterized. Thus, the HTC allows combining the advantage of surface-sensitivity of the XUV photons.…”