2023
DOI: 10.1021/acsanm.2c05088
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Heavily Doped Si Nanocrystals Formed in P-(SiO/SiO2) Multilayers: A Promising Route for Si-Based Infrared Plasmonics

Abstract: As building blocks of multifunctional materials involving coupling at the nanoscale, highly doped semiconductor nanocrystals are of great interest for potential applications in nanophotonics. In this work, we investigate the plasmonic properties of highly doped Si nanocrystals embedded in a silica matrix. These materials are obtained by evaporation of heavily phosphorus-doped SiO/SiO2 multilayers in an ultrahigh vacuum chamber followed by rapid thermal annealing. For P contents between 0.7 and 1.9 atom %, stru… Show more

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Cited by 5 publications
(1 citation statement)
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“…For instance, nanocrystalline cubic SiP was formed as inclusions in Si wafers implanted with P + ions and laser-annealed at temperatures of 450-850 °C [2]. Recently, NPs of elemental compositions close to SiP and SiP 2 have been observed in thermal annealing products of non-stoichiometric silicon oxide containing high amounts of phosphorus introduced during the fabrication; the resulting composition seems to arise from Si and P supersaturation levels [3,4]. The formation of precipitates in supersaturated silicon has also been considered as a possible mechanism involved in the deactivation of dopants [5][6][7].…”
Section: Introductionmentioning
confidence: 99%
“…For instance, nanocrystalline cubic SiP was formed as inclusions in Si wafers implanted with P + ions and laser-annealed at temperatures of 450-850 °C [2]. Recently, NPs of elemental compositions close to SiP and SiP 2 have been observed in thermal annealing products of non-stoichiometric silicon oxide containing high amounts of phosphorus introduced during the fabrication; the resulting composition seems to arise from Si and P supersaturation levels [3,4]. The formation of precipitates in supersaturated silicon has also been considered as a possible mechanism involved in the deactivation of dopants [5][6][7].…”
Section: Introductionmentioning
confidence: 99%