A new rotary scan-projection exposure system was developed for replicating patterns with widths of around 100 μm. As the first step, a reticle was fixed steady on the reticle stage, and only specimen pipes were rotated. As a result, 100-μm line-and-space (L&S) patterns were successfully replicated on whole circumferences. Deviation 3 σ of the resist pattern widths was as small as 5 μm for the mean width of 100 μm. Next, a reticle with oblique L&S patterns was also scanned synchronously with the rotation of the specimen pipe. However, stitching of patterns doubly exposed at the start and stop parts of rotary exposure was difficult. Although large patterns with widths of 400 μm were successfully replicated on whole surface, 100-μm L&S patterns were replicated only on partial areas of the pipe surface. It was clarified that yaw alignment of the reticle, and alignment between the centers of chucked pipe and the rotation stage should be improved. By working on these subjects, the new system will be graded up further more.