Helicon plasma source for ionized physical vapor deposition

Hayden, D. B.; Juliano, D. R.; Neumann, M.; Allain, M.; Ruzic, D. N.

doi:10.1016/s0257-8972(99)00488-0

Cited by 15 publications

(4 citation statements)

References 15 publications

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“…The RF (13.56 MHz) plasma system shown in Fig. 3 was also designed and fabricated at the CPMI at the UIUC 19 and was used to treat the corn seeds under a low-pressure plasma condition. To generate a low-pressure plasma, a helicon plasma source was employed and N 2 gas was used as process gas.…”

Section: Methodsmentioning

confidence: 99%

Growth of Plasma-Treated Corn Seeds under Realistic Conditions

Ahn

Gill

Ruzic

2019

Sci Rep

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In this study, the effect of the plasma treatment on corn seeds is investigated. Corn seeds were treated uniformly without burning or blackening by three kinds of plasma apparatus: RF plasma in vacuum, microwave-driven atmospheric-pressure plasma, DBD atmospheric-pressure plasma, and two other treatments: vacuum exposure only, and using plasma-activated water in the seed coating process, to investigate growth rate changes under realistic conditions. Each treatment was performed on a total of 1512 corn seeds. Seeds from each experimental condition were treated with the recommended rate of Poncho/VOTiVO with Acceleron, a commercial biological seed treatment that helps to protect the seeds from fungus, insects, and nematodes after planting. The 1512 seeds were divided evenly into three replications with 84 seeds planted for each replication at six unique locations across central Illinois. The results for germination, growth, and product yield over the 2017 growing season is presented. Overall no statistically significant difference in the yield of corn harvested was found between the control and any of the five treatments. This is likely due to the already near-100% germination rate of the corn hybrid used in the study and the use of the Poncho/VOTiVO protective coating on every sample.

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Section: Methodsmentioning

confidence: 99%

Growth of Plasma-Treated Corn Seeds under Realistic Conditions

Ahn

Gill

Ruzic

2019

Sci Rep

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“…Helicon sources are known to be effective at producing high-density plasmas and have found practical applications in the areas of semiconductor processing, 1,2 space propulsion, 3,4 fusion-relevant plasma material interaction (PMI) research, 5,6 and negative ion source development for neutral beam injectors (NBIs). 7,8 Recently, the PMI, NBI, and space propulsion communities have taken special interest in using helicon sources to create high-density light-ion plasmas.…”

Section: Introductionmentioning

confidence: 99%

Direct measurement of the transition from edge to core power coupling in a light-ion helicon source

et al. 2018

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We present time-resolved measurements of an edge-to-core power transition in a light-ion (deuterium) helicon discharge in the form of infra-red camera imaging of a thin stainless steel target plate on the Proto-Material Exposure eXperiment device. The time-resolved images measure the twodimensional distribution of power deposition in the helicon discharge. The discharge displays a mode transition characterized by a significant increase in the on-axis electron density and core power coupling, suppression of edge power coupling, and the formation of a fast-wave radial eigenmode. Although the self-consistent mechanism that drives this transition is not yet understood, the edge-to-core power transition displays characteristics that are consistent with the discharge entering a slow-wave anti-resonant regime. RF magnetic field measurements made across the plasma column, together with the power deposition results, provide direct evidence to support the suppression of the slow-wave in favor of core plasma production by the fast-wave in a light-ion helicon source.

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“…The antenna used employed in SCOPE is an m = 0 helicon plasma stabilized with external magnetic fields. Helicon plasmas have been shown to have a good potential as a secondary plasma source in applications with no threat of contamination or further debris production 9 .…”

Section: Experiments Facilitymentioning

confidence: 99%

Effect of deposition, sputtering, and evaporation of lithium debris buildup on EUV optics

et al. 2007

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One of the critical issues within extreme ultraviolet (EUV) lithography is that of mirror lifetime and the degradation due to debris buildup from the EUV pinch. This work experimentally measures the mitigation of Li debris from collecting on the surface of EUV-like optics through combined use of a helium secondary plasma, evaporation from optic materials at elevated temperatures, and preferential sputtering off of the optic material. This leads to sputter enhanced removal of the lithium debris. This applied research expands the current knowledge base in understanding lithium interactions with a helium plasma and optic surfaces and provides a basis for analytical model development. The ultimate goal is to improve the current state of the art knowledge in lithium-optic material interactions, experimentally test mitigation and renewal of optic materials, and develop a relevant model for the predictive capabilities of the mirror optics while expanding the knowledge base of lithium transport and interaction. Experimental results are measured through the use of profilometry and AFM to quantify the ability to keep the EUV optic in an as received state while being exposed to EUV like lithium debris.

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Helicon plasma source for ionized physical vapor deposition

Cited by 15 publications

References 15 publications

Growth of Plasma-Treated Corn Seeds under Realistic Conditions

Growth of Plasma-Treated Corn Seeds under Realistic Conditions

Direct measurement of the transition from edge to core power coupling in a light-ion helicon source

Effect of deposition, sputtering, and evaporation of lithium debris buildup on EUV optics

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