1997
DOI: 10.1109/27.650899
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Helicons-the past decade

Abstract: First observed in gaseous plasmas in the early 1960's, helicon discharges lay like a sleeping giant until they emerged in the 1980's, when their usefulness as efficient plasma sources for processing microelectronic circuits for the burgeoning semiconductor industry became recognized. Research on helicons spread to many countries; new, challenging, unexpected problems arose, and these have spawned solutions and novel insights into the physical mechanisms in magnetized radio-frequency discharges. Among the most … Show more

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Cited by 306 publications
(185 citation statements)
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References 79 publications
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“…In another case, as shown on the Fig. 3 of Chen and Boswell (1997), where the magnetic field profile is characterized by one node located at some distance from the tube axis, the wave field region with ion sense of polarization (close to the walls) represents around 50% of the total tube volume (case of a radiating antenna with right-hand helicity).…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…In another case, as shown on the Fig. 3 of Chen and Boswell (1997), where the magnetic field profile is characterized by one node located at some distance from the tube axis, the wave field region with ion sense of polarization (close to the walls) represents around 50% of the total tube volume (case of a radiating antenna with right-hand helicity).…”
Section: Discussionmentioning
confidence: 99%
“…Actually, both types of field polarizations have been evidenced in the interference pattern of guided whistler waves, even in the case when the helicity of the radiating antenna was adjusted for the excitation of electron-type polarized waves only (Chen and Boswell, 1997).…”
Section: Introductionmentioning
confidence: 99%
“…The concept is generally known to produce rare gas discharges with very high efficiency [5,6]. Another prominent feature is the enhancement of the coupling efficiency at a few mT external magnetic field strength, the so-called low-field peak [7], which could be enough improvement regarding the application at ion sources.…”
Section: Introductionmentioning
confidence: 99%
“…On the one hand, the use of these values ensures the clarity of the forthcoming figures. On the other hand, the chosen parameters can easily be realized if, e.g., the plasma column is created by an RF discharge under laboratory conditions (see, e.g., [15][16][17]). 2(b) and, therefore, are not given here in the interests of brevity.…”
Section: Scattering At the Surface Plasmon Resonancesmentioning
confidence: 99%