Heteroepitaxial growth and microwave plasma annealing of DC reactive sputtering deposited TiZrN film on Si (100)

Chiu, Kuo-Chi; Fu, Chia Wei; Fang, Yu Siang; Hien, Thi; Shih, Fu Han; Chang, Li

doi:10.1016/j.surfcoat.2020.125873

Cited by 4 publications

(3 citation statements)

References 34 publications

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“…Knotek et al have shown that the Ti 0.3 Hf 0.7 N films retained an initial single-phase structure after annealing at 1000 • C for 24 h [11]. Recently, we have shown that the crystalline quality of the epitaxial TiZrN film can be effectively improved by microwave plasma heating [24]. Similarly, it is expected that the TiHfN film may have better crystalline quality after high-temperature microwave plasma annealing.…”

Section: Introductionmentioning

confidence: 74%

“…For subsequent annealing of the as-deposited TiHfN film, the TiHfN/Si sample was placed on a Mo holder and loaded into a microwave plasma system (ASTeX, 2.45 GHz, MA, USA). The annealing process was similar to that used for TiZrN films [24], and for plasma nitridation of sapphire and TiO 2 to obtain epitaxial AlN and TiN, as shown in our previous studies [25][26][27]. The surface of the TiHfN film was first cleaned with pure hydrogen plasma at a microwave power of 300 W and a pressure of 13 mbar for 5 min, followed by plasma annealing with a gas flow rate of 400 sccm (2.5% H 2 /N 2 ), a power of 800 W and a pressure of 90 mbar for 2 h. The temperature of plasma annealing was 1000-1100 • C, as measured by the optical pyrometer.…”

Section: Methodsmentioning

confidence: 99%

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Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001)

Chiu

Shih

et al. 2023

Coatings

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Deposition of a heteroepitaxial TiHfN film with a growth rate of about 1 μm/h was successfully achieved on a Si (001) substrate at a temperature above 700 °C by direct current magnetron reactive sputtering of a Ti0.6Hf0.4 (in atomic fraction) target with an Ar/N2 gas mixture. Annealing of the as-deposited TiHfN/Si sample at a temperature above 1000 °C using microwave plasma with H2/N2 gas was performed to further improve the TiHfN film’s quality. X-ray diffraction results show that the heteroepitaxial TiHfN film on Si exhibits a cube-on-cube relationship as {001}TiHfN//{001}Si and <110>TiHfN//<110>Si. X-ray rocking curve measurements show that the full width at half maximum of (200)TiHfN is 1.36° for the as-deposited TiHfN film, while it is significantly reduced to 0.53° after microwave plasma annealing. The surface morphologies of the as-deposited and annealed TiHfN films are smooth, with a surface roughness of around ~2 nm. Cross-sectional scanning/transmission electron microscopy (S/TEM) shows a reduction in defects in the annealed film, and X-ray photoelectron spectroscopy shows that the film composition remains unchanged. Additionally, S/TEM examinations with atomic resolution illustrate domain matching epitaxy (DME) between TiHfN and Si at the interface. The TiHfN films have good electrical conducting properties with resistivities of 40–45 μΩ·cm.

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Section: Introductionmentioning

confidence: 74%

Section: Methodsmentioning

confidence: 99%

Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001)

Chiu

Shih

et al. 2023

Coatings

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“…Surface modified coatings prepared from ternary nitrides such as TiZrN, TiCrN, and TiAlN gained considerable attention because they retain their physiochemical properties, such as oxidation resistance, hardness, corrosion resistance, biocompatibility, and structural stability after implantation [204,205]. Magnetron sputtered TiZrN coated 316L SS substrates showed less bacterial adhesion, increased corrosion protection, and negligible human blood platelets activity than uncoated substrates [206].…”

Section: Transition Metal Nitridesmentioning

confidence: 99%

Recent Advancements in Materials and Coatings for Biomedical Implants

Kirubaharan

Chandrasekar

Dasan

et al. 2022

Gels

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Metallic materials such as stainless steel (SS), titanium (Ti), magnesium (Mg) alloys, and cobalt-chromium (Co-Cr) alloys are widely used as biomaterials for implant applications. Metallic implants sometimes fail in surgeries due to inadequate biocompatibility, faster degradation rate (Mg-based alloys), inflammatory response, infections, inertness (SS, Ti, and Co-Cr alloys), lower corrosion resistance, elastic modulus mismatch, excessive wear, and shielding stress. Therefore, to address this problem, it is necessary to develop a method to improve the biofunctionalization of metallic implant surfaces by changing the materials’ surface and morphology without altering the mechanical properties of metallic implants. Among various methods, surface modification on metallic surfaces by applying coatings is an effective way to improve implant material performance. In this review, we discuss the recent developments in ceramics, polymers, and metallic materials used for implant applications. Their biocompatibility is also discussed. The recent trends in coatings for biomedical implants, applications, and their future directions were also discussed in detail.

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Characterisation of in-situ reactive plasma-sprayed nano-(Ti, V)N composite ceramic coatings with various V concentrations

Chi

Mao

et al. 2021

Ceramics International

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Heteroepitaxial growth and microwave plasma annealing of DC reactive sputtering deposited TiZrN film on Si (100)

Cited by 4 publications

References 34 publications

Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001)

Direct Current Reactive Sputtering Deposition and Plasma Annealing of an Epitaxial TiHfN Film on Si (001)

Recent Advancements in Materials and Coatings for Biomedical Implants

Characterisation of in-situ reactive plasma-sprayed nano-(Ti, V)N composite ceramic coatings with various V concentrations

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