2016
DOI: 10.1364/ome.6.001724
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Heteroepitaxial growth of OPGaP on OPGaAs for frequency conversion in the IR and THz

Abstract: For the first time thick orientation-patterned GaP (OPGaP) was repeatedly grown heteroepitaxially on OPGaAs templates as a quasi-phase matched medium for frequency conversion in the mid and longwave IR, and THz regions. The OP templates were fabricated by wafer-bonding and in a MBE-assisted polarity inversion process. Standard low-pressure hydride vapor phase epitaxy (LP-HVPE) was used for one-step growth of up to 400 µm thick device quality OPGaP with excellent domain fidelity. The presented results can be vi… Show more

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Cited by 22 publications
(29 citation statements)
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“…This was done by purposely restricting the incorporation of Si coming from the hot reactor quartz parts. Moreover, by this the transparency of the grown GaP in the entire IR region was improved making it closer to the IR transparency of the semi-insulating (SI) GaP (Figure 10b), where the "bleaching" effect is achieved by p-type doping [59]. …”
Section: Additional Absorption Bandmentioning
confidence: 92%
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“…This was done by purposely restricting the incorporation of Si coming from the hot reactor quartz parts. Moreover, by this the transparency of the grown GaP in the entire IR region was improved making it closer to the IR transparency of the semi-insulating (SI) GaP (Figure 10b), where the "bleaching" effect is achieved by p-type doping [59]. …”
Section: Additional Absorption Bandmentioning
confidence: 92%
“…The samples are quarters of 2-inch wafers. The images are taken using stitching software at 2.5× magnification [59]. (Reproduced from [59] with the permission of OSA).…”
Section: Expensive But Low Quality Commercial Gapmentioning
confidence: 99%
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