2023
DOI: 10.1088/1361-6528/acc2c6
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Heterostructure axial GaAsSb ensemble near-infrared p–i–n based axial configured nanowire photodetectors

Abstract: In this work, we present a systematic design of growth experiments and subsequent characterization of self-catalyzed molecular beam epitaxially grown GaAsSb heterostructure axial p-i-n nanowires (NWs) on p-Si <111> for the ensemble photodetector (PD) application in the near-infrared (NIR) region. Diverse growth methods have been explored to gain a better insight into mitigating several growth challenges by systematically studying their impact on the NW electrical and optical properties to realize a high-… Show more

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Cited by 4 publications
(4 citation statements)
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“…48 The compensation of the Sb absorber region and hence the increase in absorption efficiency were marked by a substantial increase in the responsivity and external quantum efficiency. 48 This sample with ∼10 at. % Sb incorporation in the absorption region combined with segment-wise annealing shall be referred to as S10 hereafter.…”
Section: Annealing: S10mentioning
confidence: 99%
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“…48 The compensation of the Sb absorber region and hence the increase in absorption efficiency were marked by a substantial increase in the responsivity and external quantum efficiency. 48 This sample with ∼10 at. % Sb incorporation in the absorption region combined with segment-wise annealing shall be referred to as S10 hereafter.…”
Section: Annealing: S10mentioning
confidence: 99%
“…The i-GaAsSb layer segment was compensated with n-type Te-doping for 5 s over a 1 min interval to achieve lower intrinsic doping in the region. The details of compensation for the intrinsic p-nature of GaAsSb for the enhancement of absorption and material properties are discussed elsewhere . The compensation of the Sb absorber region and hence the increase in absorption efficiency were marked by a substantial increase in the responsivity and external quantum efficiency .…”
Section: Effect Of Segment-wise Heterostructure Annealing: S10mentioning
confidence: 99%
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“…In this work, we have examined conventional C–S n-i-p junction GaAsSb NWs (Figure a) grown by self-assisted molecular beam epitaxy (MBE) with variation in the intrinsic “i”- region width and a simple Te compensation approach to improve the device performance, as undoped GaAsSb is slightly p-type, which is attributed to residual acceptor impurity, namely, Ga vacancy-related defects and Ga antisite defects (V Ga Ga Sb ). , To reduce the background carrier concentration, n-dopant pulsing in the form of a GaTe source was introduced during the growth of the i-GaAsSb shell. We demonstrate the fabrication and characterization of MBE-grown room-temperature (RT) conventional devices for the application of near-IR photodetectors at wavelengths approaching 1.1 μm with high rectification ratio, enhanced responsivity and detectivity, and low series resistance.…”
Section: Introductionmentioning
confidence: 99%