“…Conceptually, a wet tool can be considered as a series of tanks (T1-T6) filled with either etchant chemicals, used to etch away the exposed photo-resist from the wafer layers, or deionized water, used to terminate the etchant action. The succession of chemical and water tanks is not necessarily alternating as reported in most research studies (Geiger, Kempf, and Uzsoy 1997;Bhushan and Karimi 2004;Zeballos, Castro, and Méndez 2011); in real plants, consecutive chemical tanks can be observed. For some chemical tanks, overexposure to the etchant will damage the wafers exposed; as a consequence, a Zero-Wait (ZW) constraint is applied; this suggests that the batch must be moved out of the "unsafe" tank when the prescribed exposure time is reached.…”