Hexamethyldisilazane vapor treatment of plasma damaged nanoporous methylsilsesquioxane films: Structural and electrical characteristics

Low‐kMaterials: Recent Advances

“…The second process utilizes reactive silylating agents to convert hydrophilic Si-OH groups into hydrophobic derivatives [113][114][115][116][117][118][119]. This reaction is best accomplished with highly reactive chlorosilanes, but the corrosive nature of the by-product HCl and the potential to introduce chloride ions makes them poor candidates.…”

k-Restoring Processes at Carbon Depleted Ultralow-k Surfaces

“…10 A widely studied repair molecule is hexamethyldisilazane (HMDS). 11 Chaabouni et al 9 showed that a treatment of the damaged ULK material with HMDS results in a decrease in the RC delay and the leakage current.…”

“…One important type of repair molecules is the group of silazanes, which can be used as a gas or solved in a hydrophobic liquid . A widely studied repair molecule is hexamethyldisilazane (HMDS) . Chaabouni et al showed that a treatment of the damaged ULK material with HMDS results in a decrease in the RC delay and the leakage current.…”

“…But due to the silylation of the OH groups a larger molecule such as trimethylsilane (TMS) replaces the hydrogen of the OH group, which results in a screening of adjacent OH groups. , Thus, an optimization of the repair process can be achieved by using repair molecules that minimize the steric hindrance effect.…”

“…group, which results in a screening of adjacent OH groups. 11,12 Thus, an optimization of the repair process can be achieved by using repair molecules that minimize the steric hindrance effect.…”