HfO2:Y2O3 ultrathin nanolaminate structures grown by ALD: Bilayer thickness and annealing temperature effects on optical properties

López, Jesús A.; Arce, J. Vázquez –; Pizá-Ruíz, P.; Nedev, N.; Farı́as, M.H.; Tiznado, H.

doi:10.1016/j.ceramint.2022.03.025

Cited by 3 publications

(1 citation statement)

References 46 publications

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“…Alternative high-index material options are being explored, such as ZrO 2 [10], Nb 2 O 5 [11], HfO 2 [12], SiN x [13][14][15], mixtures of TiO 2 with SiO 2 [16] and many others. Recent studies have shown that the mechanical loss of amorphous thin film coatings is correlated with the atomic order [17][18][19][20][21].…”

Section: Introductionmentioning

confidence: 99%

Optical properties of germania and titania at 1064 nm and at 1550 nm

Diksha,

Amato,

Spagnuolo

et al. 2024

Class. Quantum Grav.

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One of the main noise sources in current gravitational wave detectors is the thermal noise of the high-reflectivity coatings on the main interferometer optics.Coating thermal noise is dominated by the mechanical loss of the high-refractive index material within the coating stacks, Ta2O5 mixed with TiO2. For upgrades to room-temperature detectors, a mixture of GeO2 and TiO2 is an interesting alternative candidate coating material. While the rather low refractive index of GeO2 increases with increasing TiO2 content, a higher TiO2 content results in a lower threshold temperature before heat treatment leads to crystallisation, and potentially to a degradation of optical properties. For future cryogenic detectors, on the other hand, a higher TiO2 content is beneficial as the TiO2 suppresses the low-temperature mechanical loss peak of GeO2. In this paper, we present the optical properties of coatings -- produced by plasma-assisted ion-beam evaporation -- with high TiO2 content at 1550nm, a laser wavelength considered for cryogenic gravitational-wave detectors, as a function of heat-treatment temperature. For comparison, the absorption was also measured of pure GeO2. Furthermore, results at the currently-used wavelength of 1064nm are presented.

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Section: Introductionmentioning

confidence: 99%

Optical properties of germania and titania at 1064 nm and at 1550 nm

Diksha,

Amato,

Spagnuolo

et al. 2024

Class. Quantum Grav.

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Layer‐Engineered Functional Multilayer Thin‐Film Structures and Interfaces through Atomic and Molecular Layer Deposition

Heikkinen,

Ghiyasi,

Karppinen

2024

Adv Materials Inter

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Atomic layer deposition (ALD) technology is one of the cornerstones of the modern microelectronics industry, where it is exploited in the fabrication of high‐quality inorganic thin films with excellent precision for film thickness and conformality. Molecular layer deposition (MLD) is a counterpart of ALD for purely organic thin films. Both ALD and MLD rely on self‐limiting gas‐surface reactions of vaporized and sequentially pulsed precursors and are thus modular, meaning that different precursor pulsing cycles can be combined in an arbitrary manner for the growth of elaborated superstructures. This allows the fusion of different building blocks — either inorganic or organic — even with contradicting properties into a single thin‐film material, to realize unforeseen material functions which can ultimately lead to novel application areas. Most importantly, many of these precisely layer‐engineered materials with attractive interfacial properties are inaccessible to other synthesis/fabrication routes. In this review, the intention is to present the current state of research in the field by i) summarizing the ALD and MLD processes so far developed for the multilayer thin films, ii) highlighting the most intriguing material properties and potential application areas of these unique layer‐engineered materials, and iii) outlining the future perspectives for this approach.

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Influence of Annealing on Mechanical Behavior of Alumina-Tantala Nanolaminates

et al. 2023

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Mechanical properties of thin films are significant for the applicability of nanodevices. Amorphous Al2O3-Ta2O5 double and triple layers were atomic layer-deposited to the thickness of 70 nm with constituent single-layer thicknesses varying from 40 to 23 nm. The sequence of layers was alternated and rapid thermal annealing (700 and 800 °C) was implemented on all deposited nanolaminates. Annealing caused changes in the microstructure of laminates dependent on their layered structure. Various shapes of crystalline grains of orthorhombic Ta2O5 were formed. Annealing at 800 °C resulted in hardening up to 16 GPa (~11 GPa prior to annealing) in double-layered laminate with top Ta2O5 and bottom Al2O3 layers, while the hardness of all other laminates remained below 15 GPa. The elastic modulus of annealed laminates depended on the sequence of layers and reached up to 169 GPa. The layered structure of the laminate had a significant influence on the mechanical behavior after annealing treatments.

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HfO2:Y2O3 ultrathin nanolaminate structures grown by ALD: Bilayer thickness and annealing temperature effects on optical properties

Cited by 3 publications

References 46 publications

Optical properties of germania and titania at 1064 nm and at 1550 nm

Optical properties of germania and titania at 1064 nm and at 1550 nm

Layer‐Engineered Functional Multilayer Thin‐Film Structures and Interfaces through Atomic and Molecular Layer Deposition

Influence of Annealing on Mechanical Behavior of Alumina-Tantala Nanolaminates

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