High brightness extreme ultraviolet (at 13.5 nm) emission from time-of-flight controlled discharges with coaxial fuel injection

Hosokai, Tomonao; Yokoyama, Tsugio; Zhidkov, Alexei; Sato, Hiroto; Horioka, Kazuhiko; Hotta, Eiki

doi:10.1063/1.2975994

Cited by 6 publications

(3 citation statements)

References 15 publications

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“…6 the theoretical spectra are compared to recent DPP results recorded with a microcapillary laser triggered discharge [21,22]. The electron density of the DPP is expected to be the order of 10 19 −10 20 cm -3 again comparable to that in a Nd:YAG plasma.…”

Section: Fig 6: Comparison Between a Discharge Produced Plasma (Dpp)mentioning

confidence: 93%

Gd plasma source modeling at 6.7 nm for future lithography

Dunne

Higashiguchi

et al. 2011

Applied Physics Letters

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Plasmas containing gadolinium have been proposed as sources for next generation lithography at 6.x nm. To determine the optimum plasma conditions, atomic structure calculations have been performed for Gd11+ to Gd27+ ions which showed that n = 4 − n = 4 resonance transitions overlap in the 6.5–7.0 nm region. Plasma modeling calculations, assuming collisional-radiative equilibrium, predict that the optimum temperature for an optically thin plasma is close to 110 eV and that maximum intensity occurs at 6.76 nm under these conditions. The close agreement between simulated and experimental spectra from laser and discharge produced plasmas indicates the validity of our approach.

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Section: Fig 6: Comparison Between a Discharge Produced Plasma (Dpp)mentioning

confidence: 93%

Gd plasma source modeling at 6.7 nm for future lithography

Dunne

Higashiguchi

et al. 2011

Applied Physics Letters

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“…Hosokai et al have shown that the control of the injection vapor velocity by varying the ablating pulsed laser energy can improve the EUV emission efficiency. 12,13) However, the dynamics of laser-assisted discharge plasma is different from the one of conventional gas-fueled Z-pinch plasma. Study of the plasma dynamics will reveal the EUV source evolution during the laserassisted discharge.…”

Section: Introductionmentioning

confidence: 99%

Dynamic Characteristics of Laser-Assisted Discharge Plasmas for Extreme Ultraviolet Light Sources

Lü

Katsuki

Tomimaru

et al. 2010

Jpn. J. Appl. Phys.

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This paper reports the dynamics of laser-assisted discharge plasmas for extreme ultraviolet (EUV) sources. A pulsed laser was focused on the tin cathode surface to form vapor jet across 5 mm long anode–cathode gap where pulsed power was applied later on. Comparison of time-resolved pinhole EUV imaging and high speed visible photography reveals that intensive EUV is emitted only from the neck of the hot plasma, which starts showing up near the laser spot on the cathode and moves away from the cathode. This movement of the neck plasma results in the enlargement of the EUV emissive region acting as its source.

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“…Because a discharge can last for tens of microseconds, then the lifetime of the EUV plasma can be extended, 11,12 which should significantly increase the plasma efficiency and greatly expand the electrode lifetime.…”

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confidence: 99%

Counter-facing plasma focus system as a repetitive and/or long-pulse high energy density plasma source

2009

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High brightness extreme ultraviolet (at 13.5 nm) emission from time-of-flight controlled discharges with coaxial fuel injection

Abstract: Articles you may be interested inOptimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm

Cited by 6 publications

References 15 publications

Gd plasma source modeling at 6.7 nm for future lithography

Gd plasma source modeling at 6.7 nm for future lithography

Dynamic Characteristics of Laser-Assisted Discharge Plasmas for Extreme Ultraviolet Light Sources

Counter-facing plasma focus system as a repetitive and/or long-pulse high energy density plasma source

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