2004
DOI: 10.1109/led.2004.834637
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High-Capacity, Self-Assembled Metal–Oxide–Semiconductor Decoupling Capacitors

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Cited by 94 publications
(51 citation statements)
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“…[104] Additionally, block copolymers have been pursued as templates for pattern transfer in photolithography. [105] Finally, they are of great interest in healthcare materials and in realization of protein adsorption optimized surfaces where the chemistry and periodicity of the self-assembled structure can be tuned to guide protein surface packing and conformation. It is important to note that block copolymer films can be realized on flexible polymer substrates, such as PTFE, [106] PET (Figure 4b), [107] and other low-surface-energy materials, [108] which is advantageous in terms of surface modification of implant materials.…”
Section: Block Copolymersmentioning
confidence: 99%
“…[104] Additionally, block copolymers have been pursued as templates for pattern transfer in photolithography. [105] Finally, they are of great interest in healthcare materials and in realization of protein adsorption optimized surfaces where the chemistry and periodicity of the self-assembled structure can be tuned to guide protein surface packing and conformation. It is important to note that block copolymer films can be realized on flexible polymer substrates, such as PTFE, [106] PET (Figure 4b), [107] and other low-surface-energy materials, [108] which is advantageous in terms of surface modification of implant materials.…”
Section: Block Copolymersmentioning
confidence: 99%
“…Li et al have shown that PS-b-PMMA can be directed into linear arrays of parallel PMMA cylinders or hexagonal packed vertically cylinders by subtle film thickness changes using nano-imprinting on a random copolymer brush [94] Graphoepitaxy is undoubtedly a valuable and effective resolution enhancement technique for creating sub 10 nm nanoscale devices. Although graphoepitaxy is a viable approach to realising nanoscale devices, certain challenges must be overcome for the technique to be accepted for future 'complimentary' lithographic technologies, such as channel width and confinement [26,99,110,112,122], mesa to trench dimension [98,122], effect of trench wall and base chemistry [112][113]123] and importantly inhibit defect formation within both the top-down template pattern and bottom-up polymer self-assembled nanopattern [114].…”
Section: Graphoepitaxymentioning
confidence: 99%
“…Shallow-trench array capacitor (decaps) were fabricated using a 40 nm pitch hexagonal array of PMMA cylinders in a PS matrix oriented perpendicular to the substrate [123]. The template was first transferred into a silicon dioxide hard mask.…”
Section: Nano-pillars and Anti-dot Arraysmentioning
confidence: 99%
“…First real-world applications of such nanoscale patterning are beginning to be reported; for example, for use in flash memory devices and metal oxide semiconductor (MOS) capacitors. [8][9][10][11] For many potential applications the dimensions of the nanostructures need to be optimized experimentally. Tools to continuously vary the dimensions of the nanopatterns in a predictable and simple manner are required.…”
Section: Introductionmentioning
confidence: 99%