2011
DOI: 10.1063/1.3666291
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High Cubic-Phase Purity InN on MgO (001) Using Cubic-Phase GaN as a Buffer Layer

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Cited by 4 publications
(3 citation statements)
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“…2 Zincblende (zb-) III-nitrides offer a solution to overcome these challenges as they are free of both spontaneous and piezoelectric polarization (in the ⟨001⟩ growth direction) thanks to the centrosymmetric crystal structure while having similar benefits. zb-III-nitrides are realized traditionally via (i) direct deposition on zb substrates (e.g., GaAs, 5 3C−SiC, 6 Si(100), 7 and MgO 8 ) and (ii) transforming the wz-phase into a zb-one (ii.a) by impurity incorporation (such as Ga 8 ) 9 or (ii.b) by growth on V-10−12 or U-grooved 13−15 patterned silicon substrates. Benefiting from this emerging material system is only possible through theoretically investigating the electronic properties.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…2 Zincblende (zb-) III-nitrides offer a solution to overcome these challenges as they are free of both spontaneous and piezoelectric polarization (in the ⟨001⟩ growth direction) thanks to the centrosymmetric crystal structure while having similar benefits. zb-III-nitrides are realized traditionally via (i) direct deposition on zb substrates (e.g., GaAs, 5 3C−SiC, 6 Si(100), 7 and MgO 8 ) and (ii) transforming the wz-phase into a zb-one (ii.a) by impurity incorporation (such as Ga 8 ) 9 or (ii.b) by growth on V-10−12 or U-grooved 13−15 patterned silicon substrates. Benefiting from this emerging material system is only possible through theoretically investigating the electronic properties.…”
Section: Introductionmentioning
confidence: 99%
“…zb- III-nitrides are realized traditionally via (i) direct deposition on zb substrates (e.g., GaAs, 3C–SiC, Si(100), and MgO) and (ii) transforming the wz- phase into a zb- one (ii.a) by impurity incorporation (such as Ga) or (ii.b) by growth on V - or U -grooved patterned silicon substrates. Benefiting from this emerging material system is only possible through theoretically investigating the electronic properties.…”
Section: Introductionmentioning
confidence: 99%
“…Initially, hexagonal phase inclusion in both c-InN layer and c-GaN buffer layer was examined by ω-scan in X-ray reciprocal space lattice mapping (RSM) [10]. Moreover, micro Raman scattering measurement was performed for c-InN films at room temperature to evaluate the crystal quality of c-InN film as reported in previous work [11]. Bright field (BF) and dark field (DF) cross-sectional TEM images taken along the [110] zone axis were used to analyze a generation of hexagonal phase in c-InN grown layer as well as hexagonal phase in c-GaN nucleation layer.…”
Section: Methodsmentioning
confidence: 99%