In this work, ferroelectric CaBi 2 Nb 2 O 9 thin films were grown on Yttria-stabilized zirconia (YSZ) -buffered (100) Si substrate via radio-frequency magnetron sputtering. X-Ray diffraction analysis showed that the CaBi 2 Nb 2 O 9 films were (200/020) textured, while the commonly-observed (00l) grains which are weakly polarizable have been eliminated. Enhanced dielectric (~533 @ 5 kHz) and ferroelectric properties (P r ~ 13μC/cm 2 , P s ~ 55μC/cm 2 @ 1 kHz) were achieved in this high Tc piezoelectric material, leading to a significant improvement of the d 33 piezoelectric modulus (from ~15-20 pm/V to ~30 pm/v). The method of strain engineering used in this work can be applied to the integration of other bismuth-layer structured ferroelectrics into Si-based microelectronics.