2016
DOI: 10.1002/adma.201506173
|View full text |Cite
|
Sign up to set email alerts
|

High‐Current‐Density Vertical‐Tunneling Transistors from Graphene/Highly Doped Silicon Heterostructures

Abstract: A/cm 2 , about two orders of magnitude higher than previous graphene/insulator/graphene tunneling transistor at the same on/off ratio.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

3
28
0

Year Published

2016
2016
2019
2019

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 44 publications
(31 citation statements)
references
References 36 publications
3
28
0
Order By: Relevance
“…The vertical architecture of FGOTM enabled ultrashort channel length (nanometer scale) and also allowed current flow vertically across the semiconductor layer from bottom source to top drain electrode. The ultrashort channel length is simply determined by the thickness of semiconductor layer (tens of nanometers), resulting in fast operation speed and high current density greater than 2.5 mA cm −2 , which is much greater than that of conventional planar FGOTM . Moreover, the vertical FGOTM (VFGOTM) devices exhibited outstanding memory performance along with excellent mechanical stability.…”
Section: Introductionmentioning
confidence: 99%
“…The vertical architecture of FGOTM enabled ultrashort channel length (nanometer scale) and also allowed current flow vertically across the semiconductor layer from bottom source to top drain electrode. The ultrashort channel length is simply determined by the thickness of semiconductor layer (tens of nanometers), resulting in fast operation speed and high current density greater than 2.5 mA cm −2 , which is much greater than that of conventional planar FGOTM . Moreover, the vertical FGOTM (VFGOTM) devices exhibited outstanding memory performance along with excellent mechanical stability.…”
Section: Introductionmentioning
confidence: 99%
“…When the active material is sensitive to light, the devices become to field effect phototransistors (VFEpTs), which can be served as photodetectors. VFEpTs, often associated with short channel, have been studied increasingly and become a significant branch in photodetection, due to low‐voltage operation, integrated circuit architectural compatibility, and lateral detection . Till now, those photoactive materials are limited in organic molecules, i.e., pentacene, poly (2‐methoxy‐ 5‐(20‐ ethylhexyloxy‐ p ‐phenylenevinylene)), poly(3‐hexylthiophene) .…”
Section: Introductionmentioning
confidence: 99%
“…Currently, great progress of growing large-area graphene has been witnessed, enabling its potential applications in next generation of electronic devices. When the graphene is in contact with organic or inorganic semiconductors such as silicon, [67,68] [72,73] indium gallium zinc oxide (IGZO), [30] COFs, [74] black phosphorous, [75] and MoTe 2 , [76] the gate field can greatly tune the Schottky barrier height between the grapheme and semiconductor materials, for high-performance devices. [66] In addition, the large-area and high quality as well as smooth surface of graphene make it beneficial to form good contact interface with other component parts in devices for high performances.…”
Section: Graphene Electrode-based Vofets (Ge-vofets)mentioning
confidence: 99%