High current vacuum-arc ion source for ion implantation and coating deposition technologies

Abstract

This work is devoted to the development and investigation of a high current ion source based on dc vacuum-arc plasma generation. Extraction and acceleration of ion beams are realized in a repetitively pulsed mode with the pulse repetition rate up to 200 pps, the pulse duration up to 400μs, the accelerating voltage up to 40 kV, and the pulsed ion-beam current up to 2 A. To remove microparticles from the vacuum-arc plasma a straight-line plasma filter is used. Examples of the source use for realization of high-intensity and high-concentration ion implantation regimes including those with formation of doped layers at depths that exceed ion projective range for more than an order of magnitude are presented. At the expense of change in order and intensity of ion and plasma material treatment, the advantage of application of one source for execution of material surface pretreatment and activation regimes, formation of wide transition layers between the substrate and coating, coating deposition, and high-intensity ion mixing using ions of the same type was shown.

Enhancement of the Corrosion Resistance of 304 Stainless Steel by Cr–N and Cr(N,O) Coatings

“…Another particularity of the CAE method consists of the significant roughness of the coated surfaces, resulting from droplets ejected by the cathode due to its local melting. Considering this issue, different techniques have been developed, including venetian blinds, magnetic shielding, increased deposition pressure, as well as the development of more sophisticated methods consisting mainly of short-pulsed voltage applied on the substrate [27][28][29][30][31].…”

High-intensity ion implantation - a technique to form finely dispersed intermetallic compounds in surface layers of metals

“…The ion treatment regimes are given in Table 1. [9]. A distinguishing feature of the "Raduga-5" source developed at the Institute of Nuclear Physics at TPU is that it is capable of forming a periodically pulsed or continuous beam of ions with the energy up to 120 keV from the plasma of a continuous vacuum-arc discharge.…”

Equipment and methods for hybrid technologies of ion beam and plasma surface materials modification

“…CI includes based on dc VAD "Raduga-5" metal ion beam and plasma source with ion energies varying from 20 to 160 keV [16]. The source combines dc mode of microparticle filtered plasma generation with repetitively pulsed or dc ion beam formation with a pulsed ion beam current up to 2.5 A.…”

“…Conventional ion implantation is also executed in case of ion beam dc generation by "Raduga-5" [16].…”