“…With the use of plasma-assisted epitaxy, the surface of such nanostructures can be engineered to be N rich, which can protect against photo-corrosion and oxidation in harsh photocatalytic reaction. 33,34 Here, we have demonstrated that an In 0.25 Ga 0.75 N nanowire photocathode grown directly on Si wafer can exhibit relatively efficient and stable unassisted solar water splitting. At zero bias versus Pt counter electrode, an InGaN nanowire photocathode can exhibit an STH efficiency of 3.4%, which, to the best of our knowledge, is the highest efficiency value ever achieved in a single-photon system for unbiased photoelectrochemical water splitting.…”