1975
DOI: 10.1049/el:19750179
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High-efficiency TRAPATT operation in X band

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Cited by 7 publications
(1 citation statement)
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“…The epitaxial layer is phosphorus doped to a level of about 7 x 1o15 atoms/cm3 and is grown to a thickness of approximately 3.6 microns. The p+n junction is formed by a shallow, 4OKeV, boron ion implantation dose of 5 x 1o14 ions/cm2, which is subsequently driven in approximately 3.3 microns to produce a graded p+n interface (1). For optimum X-band performance, diodes were found to have an effective active layer width of 0.2 -0.4 microns, as estimated by an optical interference method (2,3), and a breakdown voltage of 28-36 Volts.…”
Section: Introductionmentioning
confidence: 99%
“…The epitaxial layer is phosphorus doped to a level of about 7 x 1o15 atoms/cm3 and is grown to a thickness of approximately 3.6 microns. The p+n junction is formed by a shallow, 4OKeV, boron ion implantation dose of 5 x 1o14 ions/cm2, which is subsequently driven in approximately 3.3 microns to produce a graded p+n interface (1). For optimum X-band performance, diodes were found to have an effective active layer width of 0.2 -0.4 microns, as estimated by an optical interference method (2,3), and a breakdown voltage of 28-36 Volts.…”
Section: Introductionmentioning
confidence: 99%