“…The epitaxial layer is phosphorus doped to a level of about 7 x 1o15 atoms/cm3 and is grown to a thickness of approximately 3.6 microns. The p+n junction is formed by a shallow, 4OKeV, boron ion implantation dose of 5 x 1o14 ions/cm2, which is subsequently driven in approximately 3.3 microns to produce a graded p+n interface (1). For optimum X-band performance, diodes were found to have an effective active layer width of 0.2 -0.4 microns, as estimated by an optical interference method (2,3), and a breakdown voltage of 28-36 Volts.…”