High electronegativity multi-dipolar electron cyclotron resonance plasma source for etching by negative ions

Stamate, Eugen; Draghici, Mihai

doi:10.1063/1.4704696

Cited by 15 publications

(12 citation statements)

References 46 publications

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“…Recently, it has been proposed to use both positive and negative-ion beams in space propulsion thrusters 3,4 , instead of positive ion beams alone to reduce neutralization issues. Negative-ion sources are also of interest for microelectronics applications 5,6,7,8,9 . Highly selective, highly anisotropic, notch-free and charge-build-up damage-free etching was evidenced on semiconductors using negative ion beams 10,11,12 .…”

Section: Introductionmentioning

confidence: 99%

Negative-ion production on carbon materials in hydrogen plasma: influence of the carbon hybridization state and the hydrogen content on H⁻yield

Ahmad¹,

Pardanaud²,

Carrère³

et al. 2014

J. Phys. D: Appl. Phys.

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Highly oriented poly crystalline graphite (HOPG), boron-doped diamond (BDD), nanocrystalline diamond (NCD), ultra-nano-crystalline diamond (uNCD), fullerenes C60 and C70 and Diamond Like Carbon (DLC) surfaces are exposed to low pressure hydrogen plasma in a 13.56 MHz plasma reactor. Relative yields of surface produced Hions due to bombardment of positive ions from the plasma are measured by an energy analyzer cum quadrupole mass spectrometer. Irrespective of plasma conditions (0.2 and 2 Pa), HOPG surfaces show the highest yield at room temperature (RT), while at high temperature (HT), the highest yield (~ 5 times compared to HOPG surface at room temperature) is observed on BDD surfaces. The shapes of ion distribution functions (IDFs) are compared at RT and HT to demonstrate the mechanism of ion generation at the surface. Raman spectroscopy analyses of the plasma exposed samples reveal surface modifications influencing Hproduction yields, while further analyses strongly suggest that the hydrogen content of the material and the sp3/sp2 ratio are the key parameters in driving surface ionization efficiency of carbon materials under the chosen plasma conditions.

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Section: Introductionmentioning

confidence: 99%

Negative-ion production on carbon materials in hydrogen plasma: influence of the carbon hybridization state and the hydrogen content on H⁻yield

Ahmad¹,

Pardanaud²,

Carrère³

et al. 2014

J. Phys. D: Appl. Phys.

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“…In PLD, ions are generally the more energetic species and are responsible for high mobility, sputtering and implantation effects at substrate level. However, only positive ions are usually referred to as ions despite the fact that it is well known that negative ion bombardment is responsible for re-sputtering and damage at the substrate in magnetron sputtering processes [1][2][3], enhancing the formation of metastable structures [4], or producing etching rates similar to positive ions [5,6]. It has been shown that negative ions produced upon RF magnetron sputtering of MgO have KEs ranging up to values higher than 500 eV [7].…”

Section: Introductionmentioning

confidence: 99%

Relevance and formation mechanisms of negative ions upon ablation of Al₂O₃

Peláez

Afonso

Chen

et al. 2012

J. Phys. D: Appl. Phys.

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The aim of this work is to study the significance of negative ions in the plasma produced by ablation of a simple oxide ceramic target (Al 2 O 3 ) at distances and fluences typically used in pulsed-laser deposition processes. The results show that negative ions are indeed produced, the majority of which (>82%) being O − that are predominantly produced by neutralization of O + followed by electron attachment. They represent one third of the O + population at low fluences for a distance of 4 cm from the target at which most deposition experiments are performed. AlO − represents up to 15% of the negative ions and their amount increases at the expense of O − as fluence is increased. The most abundant as well as the fastest species in the plasma is by far Al + that represent >80% of ions having kinetic energy <100 eV at low fluences. This result is consistent with earlier discussion on the possible existence of direct photoionization processes due to the high (6.4 eV) photon energy. Saturation effects, the formation mechanism for AlO − and Al 2+ , and expansion dynamics for negative ions are finally discussed.

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“…The discharge was produced in a cubical vacuum chamber of 40 × 40 × 40 cm 3 , equipped with 12 electron cyclotron resonance (ECR) plasma cells [37] powered by microwaves at 2.45 GHz. A more detailed description is presented elsewhere [38]. The magnetic filter used to reduce the electron temperature was removed for this set of experiments.…”

Section: Methodsmentioning

confidence: 99%

Controlling surface properties of electrospun polyphenylsulfone using plasma treatment and X-ray photoelectron spectroscopy

Norrman

Wang

Stamate

et al. 2019

Heliyon

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Plasma treatment is an efficient method to modify organic surfaces. In this work electrospun polyphenylsulfone was systematically subjected to low-pressure microwave plasma and atmospheric-pressure coplanar barrier discharge in order to control the surface chemistry, which is important for controlling surface properties. Polar anchor groups such as keto/aldehyde groups and especially carboxylic acid groups affect hydrophilicity. The composition of plasma-induced chemical anchor groups can be monitored (and thus controlled) by X-ray photoelectron spectroscopy. The atmospheric-pressure plasma provided subtle oxidation, and the low-pressure plasma provided significant oxidation that resulted in polyphenylsulfone surfaces with a very high hydrophilicity. The low-pressure plasma treated polyphenylsulfone exhibited a significant age effect over 212 days, which was attributed to a diffusion phenomenon where the polyphenylsulfone surface becomes enriched in non-oxidated polyphenylsulfone. It was shown that the improved hydrophilicity will diminish but not vanish in time.

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High electronegativity multi-dipolar electron cyclotron resonance plasma source for etching by negative ions

Cited by 15 publications

References 46 publications

Negative-ion production on carbon materials in hydrogen plasma: influence of the carbon hybridization state and the hydrogen content on H⁻yield

Negative-ion production on carbon materials in hydrogen plasma: influence of the carbon hybridization state and the hydrogen content on H⁻yield

Relevance and formation mechanisms of negative ions upon ablation of Al₂O₃

Controlling surface properties of electrospun polyphenylsulfone using plasma treatment and X-ray photoelectron spectroscopy

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High electronegativity multi-dipolar electron cyclotron resonance plasma source for etching by negative ions

Cited by 15 publications

References 46 publications

Negative-ion production on carbon materials in hydrogen plasma: influence of the carbon hybridization state and the hydrogen content on H−yield

Negative-ion production on carbon materials in hydrogen plasma: influence of the carbon hybridization state and the hydrogen content on H−yield

Relevance and formation mechanisms of negative ions upon ablation of Al2O3

Controlling surface properties of electrospun polyphenylsulfone using plasma treatment and X-ray photoelectron spectroscopy

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Negative-ion production on carbon materials in hydrogen plasma: influence of the carbon hybridization state and the hydrogen content on H⁻yield

Negative-ion production on carbon materials in hydrogen plasma: influence of the carbon hybridization state and the hydrogen content on H⁻yield

Relevance and formation mechanisms of negative ions upon ablation of Al₂O₃