High energy amplification of picosecond pulses at 248 nm

Barr, J.R.M.; Everall, Neil; Hooker, C. J.; Ross, I. N.; Shaw, M. J.; Toner, W. T.

doi:10.1016/0030-4018(88)90047-8

Cited by 74 publications

(13 citation statements)

References 14 publications

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“…The remaining values for the KrF medium's parameters assumed for determination of Es and the gain recovery curve are listed in Table I. 5 • 2, 2 ~r=3.7• and 3 [10]] and after measurement (points) from: (a) [50], (b) [57], (c) [58], (d) [59], (e) [60], (f) [61], and (g) [62] (2 ns pulse). 5 • 2, 2 ~r=3.7• and 3 [10]] and after measurement (points) from: (a) [50], (b) [57], (c) [58], (d) [59], (e) [60], (f) [61], and (g) [62] (2 ns pulse).…”

Section: Eout = Es Ln{1 + E X P ( G O L ) [ E X P ( E M / E S ) -11}mentioning

confidence: 99%

Rate equations for modelling of short-pulse rare-gas halide excimer lasers

Badziak

1996

Optical and Quantum Electronics

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In this work, on the basis of the analysis of data relating to relaxation processes and emission spectra of excimer molecules, the rate equations for modelling short-pulse rare-gas halide excimer lasers are formulated and discussed. The equations take into account relaxation processes important for short-pulse generation, such as decay of B-, C-and X-states, vibrational relaxation in these states, and B-C mixing. As a special case for these equations, simplified equations for KrF and XeCI lasers are introduced. The gain recovery curves and the dependences of saturation energy on pulse duration, computed both for KrF and XeCI, coincide well with the experimental data. Discussion of the factors influencing the gain dynamics and the saturation energy of these media, is also presented.

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Section: Eout = Es Ln{1 + E X P ( G O L ) [ E X P ( E M / E S ) -11}mentioning

confidence: 99%

Rate equations for modelling of short-pulse rare-gas halide excimer lasers

Badziak

1996

Optical and Quantum Electronics

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“…We have simulated numerically the experiment carried out there in which Nishioka et al investigated the dependence of the absorber energy transmission TˆE=E 0 on the energy density of a pulse of 10 ps in duration and ¶ˆ248 nm (E 0 and E are the pulse energies in the input and in the output respectively of absorber). This is the basic nonlinear Dependences of the e ective saturation energy of KrF and XeCl ampli®ers upon pulse duration obtained from theoretical calculations ( ) and measurements (*, *) from the following references: point a, [33]; point b, [34], point c, [35]; point d, [36]; point e, [37]; point f, [38]; point g, [39]; point h, [40]; point k, [41]; point 1, [42]. characteristic of the absorber, decisive for its behaviour in a laser system.…”

Section: Pulse Interaction With Saturable Absorbermentioning

confidence: 99%

Modelling of short-pulse generation in rare-gas halide excimer lasers I. The model and its verification

Badziak

Jabłoński

1999

Journal of Modern Optics

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In part I of this paper, a comprehensive model of a short-pulse rare-gas halide excimer (RGHE) laser consisting of excimer systems with the ground state both unbound and bound is presented. It takes into account the most important fast relaxation processes occurring in the active medium, variable cavity losses programmed externally, practical layout of the cavity elements, and also nonlinear saturable and non-saturable absorption in the laser. General equations for a short-pulse RGHE laser as well as their simpli®ed variants for KrF and XeCl lasers are formulated. Good correspondence of the model to the results of numerous experiments described in the literature is demonstrated. In part II, the model will be applied in numerical investigations of short-pulse generation in KrF and XeCl lasers by fast mode locking using a square-wave-driven Pockels modulator.

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“…In Ref. [28] a laser system is reported with the seed pulses generated at a wavelength 248 nm. The radiation energy contrast was from 43 to 0.3, depending on the preamplifier pump energy.…”

Section: Introductionmentioning

confidence: 99%

Generation of picosecond UV pulses by an Nd³⁺:YAG laser for amplification in an ArF amplifier

et al. 2015

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The scheme generating UV pulses with a duration 15 ps and output energy up to 11.5 mJ is implemented in the system consisting of a picosecond Nd 3+ : YAG laser with multistage nonlinearoptical conversion of fundamental frequency radiation into radiation with a wavelength 193 nm followed by an excimer ArF amplifier. The temporal characteristics and the contrast of the amplified pulses are measured.

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High energy amplification of picosecond pulses at 248 nm

Cited by 74 publications

References 14 publications

Rate equations for modelling of short-pulse rare-gas halide excimer lasers

Rate equations for modelling of short-pulse rare-gas halide excimer lasers

Modelling of short-pulse generation in rare-gas halide excimer lasers I. The model and its verification

Generation of picosecond UV pulses by an Nd³⁺:YAG laser for amplification in an ArF amplifier

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High energy amplification of picosecond pulses at 248 nm

Cited by 74 publications

References 14 publications

Rate equations for modelling of short-pulse rare-gas halide excimer lasers

Rate equations for modelling of short-pulse rare-gas halide excimer lasers

Modelling of short-pulse generation in rare-gas halide excimer lasers I. The model and its verification

Generation of picosecond UV pulses by an Nd3+:YAG laser for amplification in an ArF amplifier

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Generation of picosecond UV pulses by an Nd³⁺:YAG laser for amplification in an ArF amplifier