2015
DOI: 10.1016/j.tsf.2015.02.070
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High entropy alloy thin films deposited by magnetron sputtering of powder targets

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Cited by 105 publications
(42 citation statements)
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“…However, with the rapid advancement of sputtering techniques, HEA film fabricated at nanoscale can now be employed as the optimal coating material. [23,32,33] Likewise, Lee et al has used the sputtering technique to successfully manufacture metallic glass nanolattices. [19] Additionally, the flexibility of two-photon lithography (TPL) allows countless number of different lattices with several orders of hierarchy and sizes to be fabricated.…”
Section: Introductionmentioning
confidence: 99%
“…However, with the rapid advancement of sputtering techniques, HEA film fabricated at nanoscale can now be employed as the optimal coating material. [23,32,33] Likewise, Lee et al has used the sputtering technique to successfully manufacture metallic glass nanolattices. [19] Additionally, the flexibility of two-photon lithography (TPL) allows countless number of different lattices with several orders of hierarchy and sizes to be fabricated.…”
Section: Introductionmentioning
confidence: 99%
“…Among the methods for fabricating HEA films, sputtering is the most widely used because of its fast and efficient fabrication procedure [21,22]. For instance, AlCoCrCu 0.5 NiFe [23], AlCoCrCuFeNi [24], and CoCrFeCuNi HEA films [25] have previously been fabricated through sputtering, and their mechanical properties have been investigated. However, the mechanical characterizations of CoCrFeNiAl x film fabricated using the sputtering method has been little reported.…”
Section: Introductionmentioning
confidence: 99%
“…Thin film HEAs could be used as heat-or wear-resistant coatings, diffusion barriers [12] and hard coatings for cutting tools. Two of the most studied HEAs are the quinary CoCrCuFeNi alloy and the senary AlCoCrCuFeNi alloy [5,13,14,15,16,17,18,19]. The first alloy exhibits a single face-centered cubic (FCC) structure without precipitates or intermetallic phases.…”
Section: Introductionmentioning
confidence: 99%